# US 10,480,057 B2 · Apparatus and a method for plating an Nd—Fe—B magnet

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 10,480,057 B2
- Document ID: US10480057B2
- Status: Granted
- Kind: B2
- Application number: 15/041,083
- Filed: 2016-02-11
- Published: 2016-08-11
- Granted: 2019-11-19
- Earliest claimed: 2015-02-11
- Assignees: Yantai Shougang Magnetic Materials Inc.
- Applicants: Yantai Shougang Magnetic Materials Inc.
- Inventors: Kunkun Yang; Zhongjie Peng
- Web page: https://patentgrep.com/patent/US10480057B2

## CPC

- C23C 14/3414: {Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy}
- C23C 14/165: {by cathodic sputtering}
- C23C 14/24: Vacuum evaporation
- C23C 14/35: by application of a magnetic field, e.g. magnetron sputtering {(C23C14/3457 takes precedence)}
- H01J 37/32018: {Glow discharge}
- H01J 37/32027: {DC powered}
- H01J 37/32055: {Arc discharge}
- H01J 37/32449: {Gas control, e.g. control of the gas flow}
- H01J 37/34: operating with cathodic sputtering (H01J37/36 takes precedence {; methods of cathodic sputtering C23C14/34})
- H01J 37/3405: {Magnetron sputtering}
- H01J 37/3435: {Target holders (includes backing plates and endblocks)}
- H01J 49/12: using an arc discharge, e.g. of the duoplasmatron type
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

An apparatus for plating Nd—Fe—B magnet includes a cathode and a target source holder defining a predetermined distance of 5 mm to 200 mm therebetween. A pulse bias power supply having a first positive terminal connected to an anode and a first negative terminal connected to the cathode. A DC bias power supply having a second positive terminal connected to the anode and a second negative terminal connected to the target source holder. The anode is connected to the earth ground. A method for plating the Nd—Fe—B magnet includes steps of maintaining the predetermined distance of 5 mm to 200 mm between the cleaned Nd—Fe—B magnet and the target source material, increasing a first electric potential to the cathode and a second electric potential to the target source holder with the second electric potential greater than the first electric potential, and maintaining a potential differential of 0V to 500V therebetween.

## Claims

### Claim 1

An apparatus for plating an Nd—Fe—B magnet using a target source material, said apparatus comprising:
a furnace defining a vacuum chamber;
an anode being elongated disposed in said vacuum chamber of said furnace;
a cathode being elongated and disposed in said vacuum chamber of said furnace spaced from said anode and configured with the Nd—Fe—B magnet;
at least one target source holder being elongated and disposed in said vacuum chamber and supporting said anode and said cathode, said anode and said cathode and said at least one target source being disposed in a parallel and spaced relationship with one another, the cathode configured for receiving the target source material to coat the Nd—Fe—B magnet, wherein said target source material contains metal and is selected from at least one of Dysprosium, Terbium, Holmium, Praseodymium, Neodymium, Niobium, Molybdenum, Copper, Titanium, Aluminum, and Cobalt;
a thermal insulator disposed in said vacuum chamber surrounding said cathode and said at least one target source wherein said anode is located outside of said thermal insulator;
a pulse bias power supply electrically connected to said cathode and said anode for cleaning and vaporizing the target source material to plate the target source material onto the Nd—Fe—B magnet;
a DC bias power supply electrically connected to said at least one target source holder and said anode with said anode being grounded;
said furnace defining an outlet aperture in fluid communication with said vacuum chamber for withdrawing air from said vacuum chamber to reduce pressure in said vacuum pressure and an inlet aperture in fluid communication with said vacuum chamber for feeding an inert gas to said vacuum chamber;
said furnace defining an observation window for allowing a user to look into the vacuum chamber; and
an optical pyrometer disposed adjacent to said observation window and facing toward said observation window and said vacuum chamber for monitoring a temperature in said vacuum chamber;
said cathode and said at least one target source holder defining a predetermined distance between 5 mm and 200 mm between said cathode and said target source holder to increase efficiency of depositing the target source material on the Nd—Fe—B magnet and provide a uniform coating on the Nd—Fe—B magnet.

### Claim 2 (depends on 1)

The apparatus as set forth in claim 1 wherein said pulse bias power supply having a first positive terminal and a first negative terminal with said first positive terminal being electrically connected to said anode and said first negative terminal being electrically connected to said cathode for providing an electric potential between said cathode and said anode to plate the target source material onto the Nd—Fe—B magnet.

### Claim 3 (depends on 2)

The apparatus as set forth in claim 2 wherein said DC bias power supply having a second positive terminal and a second negative terminal with said second positive terminal being electrically connected to said anode and said second negative terminal being electrically connected to said at least one target source holder for providing an electric potential to said at least one target source holder and said anode to clean and vaporize the target source material.

### Claim 4 (depends on 3)

The apparatus as set forth in claim 3 wherein said anode being electrically connected to the earth ground.

### Claim 5 (depends on 1)

The apparatus as set forth in claim 1 wherein said at least one target source holder includes a first target source holder and a second target source holder disposed in said vacuum chamber sandwiching said cathode between said first target source holder and said second target source holder and in a parallel and spaced relationship with said cathode.

### Claim 6 (depends on 1)

The apparatus as set forth in claim 1 further includes a roller of permeable material and having a cylindrical shape disposed in said vacuum chamber and rotatably attached to said furnace and having an interior surface extending annularly about a center axis to define a compartment for coating the Nd—Fe—B magnet.

### Claim 7 (depends on 6)

The apparatus as set forth in claim 6 wherein said cathode is disposed in said compartment of said roller and said at least one target source holder is disposed adjacent to said roller in said vacuum chamber of said furnace.