Base material processing apparatus and detection method
AssigneeSCREEN Holdings Co., Ltd.
InventorsHiroaki Usumoto, Mitsuhiro Yoshida, Takaharu Yamamoto
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AssigneeSCREEN Holdings Co., Ltd.
InventorsHiroaki Usumoto, Mitsuhiro Yoshida, Takaharu Yamamoto
Estimating the term…
A base material processing apparatus includes first and second edge sensors and a displacement amount calculation part. The first edge sensor acquires a first detection result (R1) by detecting the position of an edge of a base material in a width direction at a first detection position. The second edge sensor acquires a second detection result (R2) by detecting the position of the edge of the base material at a second detection position. The displacement amount calculation part calculates the amount of displacement in the position of the base material in the transport direction or the amount of difference in the transporting speed of the base material on the basis of the first and second detection results (R1, R2). Thus, the amount of displacement in the position or the amount of difference in the transporting speed can be detected without depending on images such as register marks.
A base material processing apparatus comprising:
A detection method for detecting an amount of displacement in position of a long band-like base material in a transport direction or an amount of difference in transporting speed of the base material while transporting the base material in a longitudinal direction of the base material along a predetermined transport path, the method comprising operations of:
Dependencies are inferred from the claim text.