# US 10,478,867 B2 · Treatment liquid supply device using syringe, and wet treatment device

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- Number: US 10,478,867 B2
- Document ID: US10478867B2
- Status: Granted
- Kind: B2
- Application number: 15/532,846
- Filed: 2015-12-02
- Published: 2018-01-04
- Granted: 2019-11-19
- Earliest claimed: 2014-12-02
- Assignees: National Institute of Advanced Industrial Science and Technology
- Applicants: National Institute of Advanced Industrial Science and Technology
- Inventors: Shiro Hara; Sommawan Khumpuang; Akio Kobayashi; Takeshi Umino; Sonoko Matsuda
- Web page: https://patentgrep.com/patent/US10478867B2

## CPC

- B08B 3/08: the liquid having chemical or dissolving effect
- B08B 3/04: Cleaning involving contact with liquid
- B08B 3/12: by sonic or ultrasonic vibrations
- H10P 72/0402: {Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence)}
- H10P 72/0404: {for general liquid treatment, e.g. etching followed by cleaning}
- H10P 72/0414: {using mainly spraying means, e.g. nozzles}
- H10P 72/0424: {using mainly spraying means, e.g. nozzles}
- B08B: CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A treatment liquid supply device and a wet treatment device with which an extremely small quantity of the treatment liquid can be accurately supplied, as a method for supplying a treatment liquid to an extremely small wafer of half inch size, including: a syringe that sucks and discharges the treatment liquid; a treatment liquid bottle that is filled with the treatment liquid; a suction hose that has one end connected to the treatment liquid bottle and the other end connected to the syringe, and sucks the treatment liquid inside the treatment liquid bottle to the syringe; a supply hose that has one end connected to an intermediate section of the suction hose and serves to supply, to the surface of the wafer, the treatment liquid discharged by the syringe; and a three-way solenoid valve that controls opening/closing of each of the suction and supply hoses.

## Claims

### Claim 1

A wet treatment device comprising:
a stage including a locking piece for holding a wafer;
a treatment liquid supply device, comprising:
a syringe that sucks and discharges a treatment liquid onto the wafer that is arranged in the stage;
a treatment liquid tank that is filled with the treatment liquid;
a filling pipe that has one end connected to the treatment liquid tank and the other end connected to the syringe, and causes the treatment liquid filled in the treatment liquid tank to be sucked into the syringe;
a supply pipe that has one end connected to an intermediate section of the filling pipe and the other end disposed at a predetermined supply position, and supplies the treatment liquid discharged from the syringe to the predetermined supply position; and
an opening/closing valve that is attached to a connection position of the supply pipe and the filling pipe, and is capable of controlling opening/closing of each of the supply pipe and the filling pipe; and
a nozzle having a cylindrical shape, the nozzle being arranged so as to oppose the stage concentrically with the locking piece, the treatment liquid being supplied from the treatment liquid supply device to the nozzle,
wherein the nozzle is formed to have an outside diameter dimension equal to or larger than an inside diameter dimension of the locking piece.

### Claim 2 (depends on 1)

The wet treatment device according to claim 1,
wherein the syringe includes: a piston section having a pour-in port penetrating along an axial direction; and a syringe body having a bottomed cylindrical shape, at least a part on the base end side of the piston section being inserted to the syringe body in a manner movable forward or rearward in the axial direction, and
the other end of the filling pipe is connected to the pour-in port on a distal end side of the piston section of the syringe.

### Claim 3 (depends on 1)

The wet treatment device according to claim 1,
wherein the treatment liquid tank includes: an opening section for taking in the outside air accompanying suction of the treatment liquid; and a gas supply section that supplies an inert gas toward the opening section.

### Claim 4 (depends on 1)

The wet treatment device according to claim 1,
wherein the opening/closing valve is a three-way valve that can control opening/closing of the supply pipe and the filling pipe separately.

### Claim 5 (depends on 1)

The wet treatment device according to claim 1,
wherein the treatment liquid supply device supplies the treatment liquid of a quantity of a degree not spilled out from the top of the wafer onto the wafer.

### Claim 6 (depends on 5)

The wet treatment device according to claim 5, further comprising:
a treatment liquid holding material having a generally circular column shape, the treatment liquid holding material being arranged so as to oppose the stage concentrically with the wafer that is arranged in the stage,
wherein the treatment liquid supply device supplies the treatment liquid of a quantity of a degree not spilled out from a gap between the wafer arranged in the stage and the treatment liquid holding material to a gap between the wafer and the treatment liquid holding material.

### Claim 7 (depends on 5)

The wet treatment device according to claim 5,
wherein the wafer has a disk shape with 12.5 mm outside diameter.
