Optical apparatus, manufacturing method of distributed Bragg reflector laser diode and manufacturing method of optical apparatus
AssigneeElectronics and Telecommunications Research Institute
InventorsOH Kee Kwon, Su Hwan Oh, Chul-Wook Lee, Kisoo Kim
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Abstract
Provided are an optical apparatus, a manufacturing method of a distributed Bragg reflector laser diode, and a manufacturing method of the optical apparatus, the an optical apparatus including a cooling device, a distributed Bragg reflector laser diode having a lower clad including a recess region on one side of the cooling device and connected to another side of the cooling device, and an air gap between the cooling device and the distributed Bragg reflector laser diode, wherein the air gap is defined by a bottom surface of the lower clad in the recess region and a top surface of the cooling device.
Claims14
A manufacturing method of a distributed Bragg reflector laser diode, the manufacturing method comprising:
- forming gratings in a lower clad;
- forming a waveguide comprising a passive waveguide on the gratings and an active waveguide connected to the passive waveguide;
- forming an upper clad on the waveguide;
- forming a plurality of upper electrodes on the upper clad;
- forming a lower electrode layer below the lower clad;
- and
- etching a part of the lower electrode layer below the gratings and a part of the lower clad to form a lower electrode and a recess region,
- wherein when a thickness of the lower clad is 100 μm, the lower clad is etched to 80 μm or thinner, and the gratings are formed in a depth equal to or greater than 5 μm from a bottom surface of the lower clad in the recess region.
A manufacturing method of an optical apparatus, the method comprising:
- forming a distributed Bragg reflector laser diode;
- forming bumps below the distributed Bragg reflector laser diode;
- bonding a cooling device to the bumps,
- wherein a manufacturing method of the distributed Bragg reflector laser diode comprises:
- forming gratings in a lower clad;
- forming a waveguide comprising a passive waveguide on the gratings and an active waveguide connected to the passive waveguide;
- forming an upper clad on the waveguide;
- forming a plurality of upper electrodes on the upper clad;
- forming a lower electrode layer below the lower clad;
- and
- etching a part of the lower electrode layer below the gratings and a part of the lower clad to provide a lower electrode and a recess region,
- wherein when a thickness of the lower clad is 100 μm, the lower clad is etched to 80 μm or thinner, and the gratings are formed in a depth equal to or greater than 5 μm from a bottom surface of the lower clad in the recess region.
Dependencies are inferred from the claim text.