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US 10,476,005 B2Granted
Composition, laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor
AssigneeNikon Corporation
InventorsShohei Koizumi, Takashi Sugizaki, Kenji Miyamoto, Yusuke Kawakami
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Abstract
Laminate, method of manufacturing laminate, transistor, and method of manufacturing transistor using a composition having the following (a) to (c): (a) a first organic compound represented by Formula (1) below (R represents a hydrogen atom or a glycidyl group. A plurality of Rs may be identical to or different from each other, but each of at least two Rs is a glycidyl group), (b) a second organic compound represented by Formula (2) below, and (c) a photocationic polymerization initiator
Claims13
A transistor, comprising:
- a source electrode;
- a drain electrode;
- a gate electrode provided corresponding to a channel between the source electrode and the drain electrode;
- a semiconductor layer provided in contact with the source electrode and the drain electrode;
- and
- an insulator layer disposed between the source electrode and the gate electrode and between the drain electrode and the gate electrode,
- wherein the insulator layer is formed by photocationic-polymerization of a composition comprising
- a first organic compound represented by Formula (1) below,
- a second organic compound represented by Formula (2) below, and
- a photocationic polymerization initiator
- where R represents a hydrogen atom or a glycidyl group and plurality of Rs may be identical to or different from each other, but each of at least two Rs is a glycidyl group,
8 more elements
Dependencies are inferred from the claim text.