Method of manufacturing back surface junction type solar cell
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsKeiichiro Masuko, Yasufumi Tsunomura
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Abstract
A method of manufacturing a solar cell includes: forming a conductive thin film layer on a semiconductor substrate; forming an insulating film on the conductive thin film layer; forming a conductive thin film layer exposed portion by removing a part of the insulating film; forming a plating film in the conductive thin film layer exposed portion; and removing the insulating film and the conductive thin film layer in an area not overlapping the plating film, wherein the plating film formed in the forming of a plating film is formed to cover the insulating film.
Claims8
A method of manufacturing a solar cell, comprising:
- forming a conductive thin film layer on a semiconductor substrate, wherein the conductive thin film layer includes at least one of a metal thin film layer and a transparent conductive oxide film layer;
- forming an insulating film on a part of the conductive thin film layer;
- forming a plating film on the conductive thin film layer in an area not overlapping the insulating film and on a part of the insulating film;
- and
- removing the insulating film in an area not overlapping the plating film.
Dependencies are inferred from the claim text.