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US 10,475,716 B2Granted
Sensor semiconductor device and method of producing a sensor semiconductor device
AssigneeAms AG
InventorsNebojsa Nenadovic, Agata Sakic, Micha In't Zandt, Frederik Willem Maurits Vanhelmont, Hilco Suy, Roel Daamen
Life of this patent
Estimating the term…
Abstract
The sensor semiconductor device comprises a substrate (1) with a main surface (2), a sensor region (3) on or above the main surface, a coating layer (4) above the main surface, and a trench (5) formed in the coating layer around the sensor region. The trench provides drainage of a liquid from the coating layer.
Claims10
A sensor semiconductor device, comprising:
- a substrate comprising a main surface;
- a sensor region on or above the main surface;
- a sensor element in the sensor region;
- a coating layer above the main surface, the coating layer encompassing the sensor region;
- the sensor element being completely covered by the coating layer;
- the coating layer being formed of a material that can be penetrated by moisture;
- a trench in the coating layer around the sensor region, the trench providing drainage of a liquid from the coating layer;
- the coating layer having an upper surface facing away from the substrate, the upper surface being plane in an area surrounded by the trench;
- and
- a hydrophilic liner arranged between the main surface and the coating layer, the hydrophilic liner being exposed in the trench.
7 more elements
A method of producing a sensor semiconductor device, comprising:
- providing a hydrophilic liner;
- forming a coating layer encompassing a sensor region including a sensor element on or above a main surface of a substrate,
- the sensor element being completely covered by the coating layer,
- the coating layer being formed of a material that can be penetrated by moisture, and
- the hydrophilic liner being arranged between the main surface and the coating layer;
- forming a trench in the coating layer around the sensor region, the trench providing drainage of a liquid from the coating layer;
- in an area surrounded by the trench, forming the coating layer so that it has a plane upper surface facing away from the substrate;
- and
- exposing the hydrophilic liner in the trench.
6 more elements
A sensor semiconductor device, comprising:
- a substrate comprising a main surface;
- a sensor region on or above the main surface;
- a sensor element in the sensor region;
- a coating layer above the main surface, the coating layer encompassing the sensor region;
- the sensor element being completely covered by the coating layer;
- the coating layer being formed of a material that can be penetrated by moisture;
- a trench in the coating layer around the sensor region, the trench providing drainage of a liquid from the coating layer;
- and
- a hydrophilic liner arranged between the main surface and the coating layer, the hydrophilic liner being exposed in the trench.
6 more elements
Dependencies are inferred from the claim text.