Substrate processing apparatus and method of cleaning substrate processing apparatus

A method of cleaning a substrate liquid processing apparatus including:

• a substrate holder configured to hold a substrate;
• a processing liquid supply source configured to supply a first processing liquid and a second processing liquid to the substrate;
• a first cup including a liquid receiving portion and a peripheral wall portion that extends below the liquid receiving portion, the liquid receiving portion being movable up and down with respect to the peripheral wall portion, the first cup configured to recover the first processing liquid;
• a second cup disposed adjacent to and radially outward from the first cup and configured to recover the second processing liquid;
• a recovery portion defined by the peripheral wall portion that is erected on a bottom portion of the first cup and connected to a drain pipe configured to discharge the first processing fluid through the drain pipe in a first direction;
• a cleaning liquid supply source configured to supply a cleaning liquid to the recovery portion;
• and an inner wall separate from the second cup and positioned on an inner peripheral side of the first cup,
• the method comprising:
• supplying the cleaning liquid from the cleaning liquid supply unit to the recovery portion through the drain pipe in a second direction opposite the first direction;
• causing the supplied cleaning liquid to overflow from the peripheral wall portion to the second cup side so as to clean the peripheral wall portion;
• and
• moving the liquid receiving portion to a retreat position to contact an upper portion of the inner wall thereby closing a flow path to the drain pipe.