Substrate processing apparatus and substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsNaohiko Yoshihara, Kenji Kobayashi, Manabu Okutani
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Abstract
In parallel with a substrate heating step, a liquid surface sensor is used to monitor the raising of an IPA liquid film. An organic solvent removing step is started in response to the raising of the IPA liquid film over the upper surface of the substrate. At the end of the organic solvent removing step, a visual sensor is used to determine whether or not IPA droplets remain on the upper surface of the substrate.
Claims9
A substrate processing method of drying an upper surface of a substrate that is held horizontally, the substrate processing method comprising:
- a processing liquid supplying step of supplying processing liquid onto the upper surface of the substrate;
- a substrate heating step of heating the substrate to heat the processing liquid on the upper surface of the substrate;
- a processing liquid removing step of removing the processing liquid from the upper surface of the substrate;
- a processing liquid condition detecting step of detecting a height of a liquid surface of a liquid film of the processing liquid on the upper surface of the substrate in parallel with at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step;
- and
- a controlling step of controlling at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step based on a detection result in the processing liquid condition detecting step.
A substrate processing method of drying an upper surface of a substrate that is held horizontally, the substrate processing method comprising:
- a processing liquid supplying step of supplying processing liquid onto the upper surface of the substrate;
- a substrate heating step of heating the substrate to heat the processing liquid on the upper surface of the substrate;
- a processing liquid removing step of removing the processing liquid from the upper surface of the substrate;
- a processing liquid condition detecting step of detecting a condition of the processing liquid on the upper surface of the substrate in parallel with at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step;
- and
- a controlling step of controlling at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step based on a detection result in the processing liquid condition detecting step,
- wherein
- the processing liquid condition detecting step detects a form of a liquid film of the processing liquid on the upper surface of the substrate in parallel with the substrate heating step, and wherein
- the controlling step determines whether or not the form of the liquid film of the processing liquid is abnormal based on the form of the liquid film detected in the processing liquid condition detecting step.
A substrate processing method of drying an upper surface of a substrate that is held horizontally, the substrate processing method comprising:
- a processing liquid supplying step of supplying processing liquid onto the upper surface of the substrate;
- a substrate heating step of heating the substrate to heat the processing liquid on the upper surface of the substrate;
- a processing liquid removing step of removing the processing liquid from the upper surface of the substrate;
- a processing liquid condition detecting step of detecting a condition of the processing liquid on the upper surface of the substrate in parallel with at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step;
- and
- a controlling step of controlling at least one of the processing liquid supplying step, the substrate heating step, and the processing liquid removing step based on a detection result in the processing liquid condition detecting step,
- wherein
- the processing liquid condition detecting step detects a condition of the processing liquid on the upper surface of the substrate in parallel with the processing liquid removing step, and wherein
- the controlling step determines whether or not droplets of the processing liquid remain on the upper surface of the substrate based on the condition of the processing liquid detected in the processing liquid condition detecting step.
Dependencies are inferred from the claim text.