High-frequency power supply device, and control method for high-frequency power supply device
AssigneeKyosan Electric Mfg. Co., Ltd.
InventorsItsuo Yuzurihara, Ryosuke Ohma
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AssigneeKyosan Electric Mfg. Co., Ltd.
InventorsItsuo Yuzurihara, Ryosuke Ohma
Estimating the term…
In frequency control where impedance matching is performed by frequency sweep in an RF power supply device, a frequency sweep direction is specified, allowing a reflection coefficient and/or reflected power to move to a minimum, whereby it is possible to reduce a time length required until detecting the frequency that enables the reflection coefficient and/or the reflected power to be minimized. The frequency control for impedance matching in the RF power supply device is performed according to the following two-stage control; A) phase control that specifies the frequency sweep direction that allows the reflection coefficient and/or the reflected power to move to a minimum, based on the phase state of oscillating frequency, and that starts increasing or decreasing the frequency in thus specified sweep direction; and B) reflected power control where the reflection coefficient or the reflection amount is used as a control end condition for completing the frequency control.
An RF power supply device for supplying RF power to a load involving electrical discharge, comprising,
A method of controlling an RF power supply device configured to supply RF power to a load involving electrical discharge,
Dependencies are inferred from the claim text.