Virtual hierarchical layer usage
AssigneeSynopsys, Inc.
InventorsGary B Nifong, Jun Chen, James Lewis Nance, Zhen Ren, Ying Shi
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AssigneeSynopsys, Inc.
InventorsGary B Nifong, Jun Chen, James Lewis Nance, Zhen Ren, Ying Shi
Estimating the term…
Layout simulation and verification of a semiconductor chip can require extensive design rule checking (DRC) and design rules for manufacturing (DRM) analysis of the design in order to ensure proper operation. DRC and DRM can be expensive in terms of computational time and resource usage. To mitigate some of the cost, a virtual layer can be constructed for a cell instance identified in the semiconductor design. Shapes including rectangles and polygons can be determined which traverse the cell instance and are from other hierarchical layers of the design. The shapes can be combined to generate a virtual layer used for simulation, validation, DRC, DRM, etc. The virtual layer can be augmented with traversing shape information from other instances of the cell. The rectangles, polygons, and complex polygons can be combined to simplify the virtual layer. Multiple virtual layers can be generated for the simulation and validation processes.
A computer-implemented method for generating a layout of a semiconductor integrated circuit, the method comprising:
A computer system for generating a layout of a semiconductor integrated circuit, the computer system comprising:
A computer program product embodied in a non-transitory computer readable medium, which when executed by a processor, causes the processor to generate a layout of a semiconductor integrated circuit, the computer program product comprising instructions that when executed cause the processor to:
Dependencies are inferred from the claim text.