Coating compositions
AssigneeRohm and Haas Electronic Materials LLC
InventorsGregory P. Prokopowicz, Michael K. Gallagher
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Abstract
In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
Claims19
A coated substrate comprising:
- (a) a coating layer of a chemically-amplified positive photoresist composition;
- (b) above the photoresist composition, an applied aqueous composition comprising a plurality of particles
- wherein the aqueous composition comprises a solvent component that is at least 50 percent water and comprises one or more water-miscible organic solvents.
A method for processing an electronic device substrate, comprising:
- (a) applying a chemically-amplified positive photoresist layer on substrate;
- (b) applying above the photoresist layer an aqueous composition that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds,
- wherein the aqueous composition comprises a solvent component that is at least 50 percent water and comprises one or more water-miscible organic solvents.
A coated substrate comprising:
- (a) a coating layer of a chemically-amplified positive photoresist composition;
- (b) above the photoresist composition, an aqueous composition that comprises 1) hafnia or zirconia and 2) one or more resin distinct from hafnia or zirconia, wherein the aqueous composition has a solvent component that is at least 50 percent water.
A coated substrate comprising:
- (a) a coating layer of a chemically-amplified positive photoresist composition;
- (b) above the photoresist composition, an applied aqueous composition comprising a plurality of particles,
- wherein the aqueous composition comprises 1) an acid or acid generator and 2) a solvent component that is at least 50 percent water and comprises one or more water-miscible organic solvents.
Dependencies are inferred from the claim text.