Optical element
AssigneeDow Silicones Corporation
InventorsFengqiu Fan, Brian R. Harkness, Jr., Junying Liu, Wei Rong, Takeaki Tsuda, Michael L. Bradford
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Abstract
An optical element comprises an antireflective layer that is disposed on and in contact with a substrate. The antireflective layer has a refractive index of greater than 1 to less than 1.41 and has a pore size ranging from greater than 0 to less than 300 nm. The antireflective layer includes an outermost surface having a water contact angle ranging from greater than or equal to 70° to less than or equal to 120° as determined using ASTM 5946-04.
Claims12
An optical element comprising:
- a substrate;
- and
- an antireflective layer comprising:
- a first layer comprising an oxidatively-cured product of a silicon-based resin selected from a silsesquioxane resin having a number average molecular weight from 600 to 150,000 grams per mole (g/mol) and having the formula:
- (R3SiO1/2))a(R2SiO2/2)b(RSiO3/2)c(SiO4/2)d
- wherein each R is independently chosen from hydrogen, alkyl and alkenyl groups, and alkyl and alkenyl groups substituted with halogen, nitrogen, oxygen, and sulfur atoms, provided that on average at least two R groups are hydrogen, wherein a, b, c and d are mole fractions, wherein a+b+c+d is one and wherein c+d is greater than zero, disposed on and in direct contact with the substrate and having a refractive index ranging from greater than 1 to less than 1.41 and having a pore size ranging from greater than 0 to less than 300 nanometers (nm), wherein an outermost surface of the antireflective layer has a water contact angle ranging from greater than or equal to 70 degrees)(°) to less than or equal to 120° as determined using ASTM 5946-04;
- and
- an outermost layer disposed on and in direct contact with the first layer such that the first layer is between the substrate and the outermost layer.
A method for forming an optical element comprising a substrate and an antireflective layer disposed on and in direct contact with the substrate and having a refractive index ranging from greater than 1 to less than 1.41 and having a pore size ranging from greater than 0 to less than 300 nanometers (nm), wherein an outermost surface of the antireflective layer has a water contact angle ranging from greater than or equal to 70 degrees)(°) to less than or equal to 120° as determined using ASTM 5946-04, the method for forming the optical element comprising:
- (I) applying a silicon-based resin on the substrate;
- (II) oxidatively curing the silicon-based resin on the substrate to form a first layer disposed on and in direct contact with the substrate, the first layer having a pore size ranging from greater than 0 to less than 300 nm;
- and
- (III) disposing an outermost layer on and in direct contact with the first layer such that the first layer is between the substrate and the outermost layer;
- wherein the silicon-based resin is selected from a silsesquioxane resin having a number average molecular weight from 600 to 150,000 grams per mole (q/mol) and having the formula:
- (R3SiO1/2)a(R2SiO2/2)b(RSiO3/2)c(SiO4/2)d
- wherein each R is independently chosen from hydrogen, alkyl and alkenyl groups, and alkyl and alkenyl groups substituted with halogen, nitrogen oxygen, an sulfur atoms, provided that on average at least two R groups are hydrogen, wherein a, b, c and d are mole fractions, wherein a+b+c+d is one and wherein c+d is greater than zero.
Dependencies are inferred from the claim text.