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US 10,471,465 B2Granted
Method for forming regular polymer thin films using atmospheric plasma deposition
AssigneeLuxembourg Institute of Science and Technology (List)
InventorsNicolas Boscher, Patrick Choquet, David Duday, Florian Hilt
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Abstract
The invention provides a method for forming regular polymer thin films on a substrate using atmospheric plasma discharges. In particular, the method allows for the deposition of functional polymer thin films which require a high regularity and a linear polymer structure.
Claims23
A method for forming a polymer film on a substrate, comprising the following subsequent steps:
- providing a mixture comprising at least one polymer forming material;
- and
- applying a sequence of atmospheric plasma pulses to the mixture in order to form a polymer film on a surface portion of a substrate, which is contacted by said mixture;
- wherein each plasma pulse presents a duration tON, comprised between one nanosecond and one microsecond, during which the plasma is discharged, and a duration tOFF, comprised between one microsecond and one second, during which the plasma is not discharged;
- and
- wherein the duty-cycle of a plasma pulse tON/(tON+tOFF) is lower than 0.1%.
3 more elements
Dependencies are inferred from the claim text.