Method for patterning amorphous alloy, amorphous alloy pattern structure using the same, dome switch, and method for manufacturing dome switch

A method for patterning an amorphous alloy, the method comprising:

• forming, on a parent material, a pattern that defines a first region on the parent material as an amorphous alloy deposition region;
• forming, on the parent material, an amorphous alloy deposition layer on the first region and on a second region on the parent material different from the first region;
• and
• etching the second region so that the amorphous alloy deposition layer is removed from the second region,
• wherein the forming of the pattern comprises:
• forming a protective layer on the upper surface of the parent material;
• forming a material layer that reacts with acid on an upper surface of the protective layer;
• and
• removing portions of the protective layer and the material layer that are formed on the first region, such that other portions of the protective layer and the material layer remain as the pattern that defines the first region and the second region.

A method for manufacturing a dome switch, the method comprising:

• preparing a dome-shaped metal layer, the dome-shaped metal layer having a protruding central portion that, in response to an external force being applied to the protruding central portion, moves toward a point below the dome-shaped metal layer;
• forming an amorphous alloy layer on one surface of the dome-shaped metal layer;
• and
• forming a metal thin film on an other surface of the dome-shaped metal layer,
• wherein the metal thin film contacts a circuit board in response to the external force being applied to the protruding central portion and the amorphous alloy layer does not contact the circuit board in response to the external force being applied to the protruding central portion.