Apparatus for electrochemical additive manufacturing
AssigneeFabric8Labs, Inc.
InventorsDavid Forrest Pain, David Morgan Wirth, Jeffrey William Herman
Life of this patent
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Abstract
An apparatus for stereo-electrochemical deposition of metal layers consisting of an array of anodes, a cathode, a positioning system, a fluid handling system for an electrolytic solution, communications circuitry, control circuitry and software control. The anodes are electrically operated to promote deposition of metal layers in any combination on the cathode to fabricate a structure.
Claims20
An apparatus comprising:
- a reaction chamber configured to retain an electrolyte;
- an anode array containing a plurality of anodes stationary with respect to one another, the anode array disposed in the reaction chamber and configured to be immersed in the electrolyte such that the plurality of anodes are in fluid contact with one another through the electrolyte, and such that the plurality of anodes cause a deposition of a unitary layer structure or a series of unitary layer structures;
- a cathode disposed in the reaction chamber and configured such that the cathode is in fluid and in contact with the plurality of anodes through the electrolyte;
- a system for electro-mechanically positioning either the anode array the cathode, or both to control the distance between the anode array and the cathode;
- at least one sensor for individually measuring an electrical current and or voltage of one of the plurality of anodes;
- and
- a microcontroller, coupled to the system for electro-mechanically positioning either the anode array, the cathode, or both, coupled to the at least one sensor, and coupled to a source of layer slice information, programmed with instructions that when executed by the microcontroller cause the microcontroller to:
- (i) control the current or voltage applied to each anode of the plurality of anodes;
- and
- (ii) control the electro-mechanical positioning of the anode array, or the cathode, or both to control the distance between the anode array and the cathode during an electrochemical deposition to cause the deposition of the unitary layer structure or the series of unitary layer structures.
In a reaction chamber configured to retain an electrolyte, the reaction chamber having an anode array containing a plurality of anodes stationary with respect to one another, and a cathode disposed in the reaction chamber such that the plurality of anodes and the cathode are all in fluid contact through the electrolyte, a method comprising:
- a) at a microcontroller programmed with instructions that when executed by the microcontroller cause the microcontroller to control the current or voltage applied to each anode of the plurality of anodes as defined by layer slice information about a structure to be fabricated layer by layer in the reaction chamber;
- b) under the control of the microcontroller, providing to the reaction chamber the electrolyte containing metal ions to be deposited on the cathode;
- c) under the control of the microcontroller, adjusting the distance between the anode array and the cathode;
- d) under the control of the microcontroller, processing the layer slice information for the layer to be fabricated, depositing the layer to be fabricated on the cathode by providing current or voltage to the anode array thereby causing an electrochemical reaction at the cathode;
- e) individually monitoring the electrical current and or voltage at one of the plurality of anodes to detect when the deposit reaches a target layer thickness at each anode to cause a uniform layer deposit;
- and
- f) repeating steps (a) through (e) for each layer of the structure to be fabricated until all layers are deposited.
Dependencies are inferred from the claim text.