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US 10,444,627 B2Granted
Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device
AssigneeFUJIFILM Corporation
InventorsHiroo Takizawa, Toru Fujimori, Wataru Nihashi, Shuji Hirano, Natsumi Yokokawa
Life of this patent
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Abstract
There are provided a pattern formation method, including: (1) forming a film using an active light-sensitive or radiation-sensitive resin composition; (2) exposing the film to active light or radiation; and (3) developing the exposed film using a developer including an organic solvent, wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific repeating units, and a crosslinking agent (C).
Claims19
A pattern formation method, comprising:
- (1) forming a film using an active light-sensitive or radiation-sensitive resin composition;
- (2) exposing the film to active light or radiation;
- and
- (3) developing the exposed film using a developer including an organic solvent,
- wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit represented by General Formula (I) and a repeating unit represented by General Formula (III-1), and a crosslinking agent (C),
- wherein, in General Formula (I), each of R41, R42, and R43 independently represents a hydrogen atom, an alkyl group, a halogen atom, a cyano group, or an alkoxycarbonyl group;
- here, R42 may be bonded to Ar4 to form a ring, and R42 in this case represents a single bond or an alkylene group;
- X4 represents a single bond, —COO—, or —CONR44—, and, in the case of forming a ring with R42, represents a trivalent connecting group;
- R44 represents a hydrogen atom or an alkyl group;
- L4 represents a single bond or an alkylene group;
- Ar4 represents an (n+1) valent aromatic ring group, and, in the case of being bonded to R42 to form a ring, represents an (n+2) valent aromatic ring group;
- and n represents an integer of 1 to 4,
- wherein, in General Formula (III-1), each of R1 and R2 independently represents an alkyl group having 2 to 10 carbon atoms, each of R11 and R12 independently represents an alkyl group, and R13 represents a hydrogen atom or an alkyl group;
- R11 and R12 may be connected to each other to form a ring, and R11 and R13 may be connected to each other to form a ring;
- Ra represents a methyl group, a hydroxymethyl group, or a perfluoroalkyl group having 1 to 4 carbon atoms, L5 represents a single bond, or an alkylene group, —COO-L1-, —O-L1-, or a divalent connecting group selected from the groups formed by combining two or more thereof, and L1 represents an alkylene group or a cycloalkylene group.
12 more elements
Dependencies are inferred from the claim text.