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US 10,437,148 B2Granted
Resist material, resist composition and method for forming resist pattern
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsTakumi Toida, Takashi Sato, Masatoshi Echigo
Life of this patent
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Abstract
The resist material according to the present invention contains a compound represented by the following formula (1): wherein each R0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom; and each p is independently an integer of 0 to 4.
Claims17
A resist material comprising a compound represented by the following formula (3):
- wherein each R is independently a hydrogen atom or an acid dissociation reactive group, wherein at least one of R is an acid dissociation reactive group;
- and each n is independently an integer of 0 to 4, wherein at least one of n is an integer of 1 to 4, wherein the acid dissociation reactive group is a group selected from the group consisting of the following:
- wherein R5 is a hydrogen atom, or a linear or branched alkyl group haying 1 to 4 carbon atoms;
- R6 is a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a cyano group, a nitro group, a heterocyclic group, a halogen atom, or a carboxyl group;
- n1 is an integer of 0 to 4;
- n2 is an integer of 1 to 5;
- and n0 is an integer of 0 to 4.
4 more elements
A resist composition comprising:
- a resin obtained through a reaction of at least a compound represented by the following formula (1) with a compound having crosslinking reactivity:
- wherein each R0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom;
- and each p is independently an integer of 0 to 4;
- and
- at least one of an acid generating agent and an acid crosslinking agent.
2 more elements
A resist composition comprising:
- a resist material including a compound represented by the following formula (3)
- wherein each R is independently a hydrogen atom or an acid dissociation reactive group, wherein at least one of R is an acid dissociation reactive group;
- and each n is independently an integer of 0 to 4, wherein at least one of n is an integer of 1 to 4, wherein the acid dissociation reactive group is a group selected from the group consisting of the following:
- wherein R5 is a hydrogen atom, or a linear or branched alkyl group having 1 to 4 carbon atoms;
- R6 is a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a cyano group, a nitro group, a heterocyclic group, a halogen atom, or a carboxyl group;
- n1 is an integer of 0 to 4;
- n2 is an integer of 1 to 5;
- and n0is an integer of 0 to 4;
- a solvent;
- and
- an acid generating agent.
8 more elements
A resist composition comprising:
- a resist material including a compound represented by the following formula (3)
- wherein each R is independently a hydrogen atom or an acid dissociation reactive group, wherein at least one of R is an acid dissociation reactive group;
- and each n is independently an integer of 0 to 4, wherein at least one of n is an integer of 1 to 4, wherein the acid dissociation reactive group is a group selected from the group consisting of the following:
- wherein R5 is a hydrogen atom, or a linear or branched alkyl group having 1 to 4 carbon atoms;
- R6 is a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a cyano group, a nitro group, a heterocyclic group, a halogen atom, or a carboxyl group;
- n1 is an integer of 0 to 4;
- n2 is an integer of 1 to 5;
- and n0 is an integer of 0 to 4;
- a solvent;
- and
- an acid crosslinking agent.
8 more elements
A method for forming a resist composition comprising the steps of:
- obtaining a resist material comprising a compound represented by the following formula (1)
- wherein each R0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom;
- and each p is independently an integer of 0 to 4;
- and
- forming the resist composition from the resist material and at least one of an acid generating agent and an acid crosslinking agent;
- wherein at least one p is an integer of 1 to 4.
3 more elements
Dependencies are inferred from the claim text.