Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby

A method of manufacturing a shadow mask, wherein hybrid processing is used to form a mask pattern on the shadow mask, the method comprising:

• forming a wet-etched pattern by performing wet etching from above a base;
• forming a laser-processed pattern that continues from the wet-etched pattern, by performing laser processing from above the base or from below the base on which the wet-etched pattern is formed,
• wherein at the forming the laser-processed pattern, a masking part having a masking pattern corresponding to the mask pattern of the shadow mask is formed above an upper surface of the base, and a laser beam is irradiated from above the masking part,
• wherein the masking part includes a body through which the laser beam passes, and a slit-shaped masking pattern formed on an upper surface of the body, the masking pattern including a plurality of laser blocking parts separated from each other in a width direction of the body and a plurality of laser transmitting parts that are spaces defined between the laser blocking parts and transmit the laser beam therethrough,
• wherein the slit-shaped masking pattern is configured such that widths of the laser blocking parts become narrower in a direction from an exterior to a center of the body and widths of the laser transmitting parts become wider in the direction from the exterior to the center of the body,
• wherein when irradiating the laser beam from above the masking part,
• the laser beam is irradiated from above the slit-shaped masking pattern of the masking part such that intensity of the laser beam irradiated onto the base at a portion corresponding to a laser transmitting part having a relatively wider width is higher than intensity of the laser beam irradiated onto the base at a portion corresponding to a laser transmitting part having a relatively narrower width.