Method for forming an electrode structure for a capacitive touch sensor

A method of forming an electrode structure for a capacitive touch sensor, wherein the capacitive touch sensor includes a first transparent conductive layer that is located on a first side of a glass substrate, and a second side of the glass substrate includes a color filter layer over-coated with a transparent non-conductive layer and a second transparent conductive layer, the method comprising:

• generating, using a pulsed solid state laser, a laser beam, wherein:
• the laser beam has a wavelength in a first range of 257 nm to 266 nm;
• and
• the laser beam has a pulse length in a second range of 50 fs to 50 ns;
• and
• while (i) the first transparent conductive layer is located on the first side of the glass substrate and (ii) the color filter layer and the second transparent conductive layer are located on the second side of the glass substrate, forming, using the laser beam, a pattern in the first transparent conductive layer, wherein:
• the pattern includes a plurality of grooves;
• for each groove of the plurality of grooves, a first side of the groove is electrically isolated from a second side of the groove;
• and
• the laser beam is configured to, while forming the pattern, produce substantially no damage to the color filter layer, the transparent non-conductive layer, and the second transparent conductive layer.