Adherend recovery method, adherend recovery apparatus, gas-generating film and resin composition
AssigneeJsr Corporation
InventorsKatsuhiko Hieda, Tsutomu Shimokawa, Hiroto Kubo, Takashi Doi
Life of this patent
Estimating the term…
Abstract
The invention is an adherend recovery method capable of recovering adherends such as cells no matter the types of adherends. An adherend recovery method for recovering an adherend from a support includes exposing a stack disposed on the support, the stack including a photosensitive gas generation layer, an adhesive layer and the adherend in this order on the support, generating a gas from the photosensitive gas generation layer by the exposure to separate the support and the stack from each other by the action of the gas, and recovering the adherend from the support by recovering the stack separated.
Claims6
An adherend recovery method for recovering an adherend from a support, comprising:
- a step (I) of exposing a stack disposed on the support, the stack including a photosensitive gas generation layer, an adhesive layer and the adherend in this order on the support, a step (II) of generating a gas from the photosensitive gas generation layer to separate the support and the stack from each other by the action of the gas, and a step (III) of recovering the adherend from the support by recovering the stack separated,
- wherein the adherend is a biological cell.
Dependencies are inferred from the claim text.