Laser polycrystallization apparatus

A laser polycrystallization apparatus, comprising:

• a light source for emitting a laser beam;
• a diffraction grating for receiving the laser beam from the light source, changing a path and a magnitude of the received laser beam, and outputting the changed laser beam;
• a light split portion for splitting the laser beam received from the diffraction grating;
• and
• a light superposition for superposing the split laser beams received from the light split portion and irradiating the superposed split laser beams to a substrate,
• wherein an angle between the laser beam irradiated to an incidence surface of the diffraction grating from the light source and a line substantially perpendicular to an emission surface of the diffraction grating is an acute angle, wherein a wavelength of the laser beam emitted from the light source is about 343 nm.

A laser polycrystallization apparatus, comprising:

• a light source;
• a diffraction grating including a plurality of gratings, each grating having a triangular shape;
• a first lens array including a plurality of first lenses;
• a second lens array including a plurality of second lenses, wherein the first lens array is disposed between the second lens array and the diffraction grating;
• a first condensing lens including an emission surface with a convex shape;
• and
• a second condensing lens including an incidence surface with a convex shape, wherein the incidence surface of the second condensing lens faces the emission surface of the first condensing lens.