Wafer-based charged particle accelerator, wafer components, methods, and applications

A wafer-based charged particle accelerator, comprising:

• a charged particle source;
• at least one RF charged particle accelerator wafer sub-assembly comprising:
• a wafer having electrical isolation between at least a first and a second electrically conductive electrode,
• wherein at least the first and the second electrode are disposed on respective and opposing first and second sides of the wafer, and create an electric field,
• further wherein the wafer has one or more orifices through which a charged particle beam can travel, encountering the electric field generated by the at least first and second electrode,
• further wherein the second electrode is in the form of an RF resonator configured as either
• a) a thin film inductor in series with an air gap capacitor, or
• b) a coplanar waveguide resonator,
• so as to transform a low voltage on the substrate to a high voltage on the second side of the substrate;
• and
• RF voltage-generating electronics disposed on the substrate;
• and
• a power supply operatively coupled to the at least one RF charged particle accelerator wafer sub-assembly.