Display device and method for manufacturing the same

A method for manufacturing a display device including a plurality of pixels arranged in a two-dimensional matrix and respectively including a first light emitting element, a second light emitting element, and a third light emitting element matrix,

• each of the pixels including a lowermost layer/interlayer insulation layer, a first interlayer insulation layer formed on the lowermost layer/interlayer insulation layer, a second interlayer insulation layer formed on the first interlayer insulation layer, and an uppermost layer/interlayer insulation layer,
• each of the light emitting elements including:
• a first electrode formed on the uppermost layer/interlayer insulation layer;
• an insulation film formed at least on a region of the uppermost layer/interlayer insulation layer where the first electrode is not formed;
• an organic layer formed over the insulation film from above the first electrode and including a light emitting layer containing an organic light emitting material;
• and
• a second electrode formed on the organic layer,
• the first light emitting element including a first light reflecting layer formed on the lowermost layer/interlayer insulation layer,
• the second light emitting element including a second light reflecting layer formed on the first interlayer insulation layer, and
• the third light emitting element including a third light reflecting layer formed on the second interlayer insulation layer, the method comprising:
• (A) forming a lowermost layer/interlayer insulation layer, a patterned first interlayer insulation layer, and a patterned second interlayer insulation layer;
• then
• (B) forming a light reflecting layer on an entire upper surface of the structure resulting from step (A) and then patterning the light reflecting layer to form a first light reflecting layer on a region of the lowermost layer/interlayer insulation layer where a first light emitting element is to be formed, to form a second light reflecting layer on a region of the first interlayer insulation layer where a second light emitting element is to be formed, and to form a third light reflecting layer on a region of the second interlayer insulation layer where a third light emitting element is to be formed;
• then
• (C) etching at least a portion of the first interlayer insulation layer located in a boundary region between the first light emitting element and the second light emitting element to form a first recess, at the same time
• etching at least a portion of the second interlayer insulation layer located in a boundary region between the second light emitting element and the third light emitting element to form a second recess, and at the same time
• etching at least a portion of the first interlayer insulation layer and a portion of the second interlayer insulation layer located in a boundary region between the first light emitting element and the third light emitting element to form a third recess;
• then
• (D) forming an uppermost layer/interlayer insulation layer on an entire upper surface of the structure resulting from step (C) and then flattening the uppermost layer/interlayer insulation layer to form a first groove, a second groove, and a third groove in a portion of the uppermost layer/interlayer insulation layer above the first recess, the second recess, and the third recess, respectively;
• and then
• (E) forming a light shielding layer inside the first groove, the second groove, and the third groove.