Substrate processing method, substrate processing apparatus and a computer-readable storage medium

A substrate processing method comprising:

• a first step that takes an image of an end face of a reference substrate, whose warp amount is known, over a whole periphery of the reference substrate by means of a camera;
• a second step that performs image processing of the image taken in the first step, thereby to obtain shape data of the end face of the reference substrate over a whole periphery of the reference substrate;
• a third step that takes an image of an end face of a process substrate over a whole periphery of the process substrate by means of a camera;
• a fourth step that performs image processing of the image taken in the third step, thereby to obtain shape data of the end face of the process substrate over a whole periphery of the process substrate;
• a fifth step that calculates a warp amount of the process substrate based on the shape data obtained in the second step and the shape data obtained in the fourth step;
• a sixth step that supplies a coating liquid to a surface of the process substrate thereby to form a coating film on the surface of the process substrate;
• a seventh step that determines a supply position from which an organic solvent is to be supplied to a peripheral portion of the coating film, based on the warp amount calculated in the fifth step, and supplies the organic solvent from the supply position to dissolve the peripheral portion of the coating film and remove the same from the process substrate.