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US 10,381,217 B2Granted
Method of depositing a thin film
AssigneeWonik Ips Co., Ltd.
InventorsByung Chul Cho, Sang Jin Lee, In Hwan Yi, Kwang Seon Jin
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Abstract
In a method of deposition a thin film, a substrate having a pattern may be provided. A surface of the substrate may be treated using a deposition-suppressing gas to form a deposition-suppressing layer on the pattern. A process gas may be applied to the pattern to deposit the thin film. The deposition-suppressing gas may include fluorine.
Claims14
A method of depositing to a thin film, the method comprising:
- providing a substrate having a pattern;
- treating a surface of the substrate using a deposition-suppressing gas including fluorine to form a deposition-suppressing layer on the pattern to suppress depositing a first thin film;
- forming the first thin film using a process gas on the substrate;
- removing the deposition-suppressing layer;
- and
- depositing a second thin film on the first thin film and the pattern by predetermined N-cycle.
3 more elements
Dependencies are inferred from the claim text.