Charged particle beam writing apparatus and charged particle beam writing method

A charged particle beam writing apparatus comprising:

• a dimension variation amount calculation unit configured to calculate a dimension variation amount due to a loading effect by using a pattern area density of each mesh region obtained by virtually dividing a writing region into a plurality of mesh regions;
• a proximity effect correction dose coefficient calculation unit configured to calculate a proximity effect correction dose coefficient for correcting a dimension variation due to a proximity effect by using the pattern area density;
• a loading effect correction dose coefficient acquisition unit configured to acquire a loading effect correction dose coefficient corresponding to a calculated dimension variation amount due to the loading effect and a calculated proximity effect correction dose coefficient, by using a correlation of the loading effect correction dose coefficient for correcting the dimension variation due to the loading effect, the proximity effect correction dose coefficient for correcting the dimension variation due to the proximity effect, and the dimension variation amount due to the loading effect;
• a dose calculation unit configured to calculate a dose of a charged particle beam by using an acquired loading effect correction dose coefficient and a dose modulation value, which has previously been input from an outside and in which an amount of correction of the dimension variation due to the proximity effect has been included;
• and
• a writing unit configured to write a pattern on a target object with the charged particle beam of the dose,
• wherein the loading effect correction dose coefficient is defined by a value where a term obtained by dividing a dimension variation amount due to a loading effect by a dose latitude which is a coefficient indicating a relation between a pattern dimension and a dose of an electron beam and which depends upon a proximity effect density is used as an exponential index.