Monitoring apparatus, method and system of the same
AssigneeHitachi, Ltd.
InventorsKei Imazawa, Takaharu Matsui
Life of this patent
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AssigneeHitachi, Ltd.
InventorsKei Imazawa, Takaharu Matsui
Estimating the term…
The monitoring apparatus includes: a processing unit and a data storage unit, in which the data storage unit stores image data of a work situation including a worker and a work object and model data including data indicating that a combination of a positional relationship between an area of the worker and an area of the work object has appeared in the past, and in which the processing unit includes a recognition unit that recognizes the areas of the worker and the work object from the input image, a combination area specification unit that specifies the combination of the positional relationship of the recognized areas of the worker and the work object, a model acquisition unit that acquires the model data from the data storage unit, and an abnormality degree calculation unit that calculates an abnormality degree in the combination of the areas of the worker and the work object.
A monitoring apparatus comprising a processing unit and a data storage unit,
A monitoring method comprising:
A monitoring system comprising a monitoring apparatus including a processing unit and a data storage unit and an external apparatus that outputs a situation relating to an abnormality from the monitoring apparatus,
Dependencies are inferred from the claim text.