Liquid processing apparatus

A liquid processing apparatus, comprising:

• a substrate holding part configured to hold a substrate horizontally and rotate the substrate around a vertical axis;
• a processing liquid supply part configured to supply a processing liquid to the substrate held by the substrate holding part;
• a cup body provided so as to surround the substrate on the substrate holding part and configured to drain the processing liquid scattered by a rotation of the substrate;
• a solvent supply part configured to supply a solvent for dissolving a solid component generated from the processing liquid;
• an exhaust path member having an exhaust port opened inside the cup body, and configured to exhaust an atmosphere around the substrate held by the substrate holding part through the cup body;
• and
• a liquid diffusion part having a concavo-convex pattern and provided on an inner surface of an exhaust path so that the solvent supplied from the solvent supply part is spread by a capillary phenomenon inside the exhaust path through which the atmosphere around the substrate is exhausted, the exhaust path being formed inside the cup body and the exhaust path member.