Polymer, negative resist composition, and pattern forming process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Daisuke Domon
Life of this patent
Estimating the term…
Abstract
A polymer comprising recurring units derived from vinylanthraquinone, recurring units containing a benzene ring having a hydroxyl-bearing tertiary alkyl group bonded thereto, and recurring units derived from hydroxystyrene is provided. The polymer is used as a base resin to formulate a negative resist composition having a high resolution and minimal LER.
Claims19
A polymer consisting essentially of recurring units having the formula (a), recurring units having the formula (b), recurring units having the formula (c), and optionally recurring units (d) having an adhesive group selected from among lactone ring and cyano groups, and recurring units of at least one type selected from recurring units having the formulae (f1) to (f3), the polymer having a weight average molecular weight of 1,000 to 500,000,
- wherein RA is each independently hydrogen or methyl, R1 is hydroxyl, C1-C4 straight or branched alkyl, C1-C4 straight or branched alkoxy, acetoxy, or halogen, R2 and R5 are each independently C1-C4 straight or branched alkyl or halogen, R3 and R4 are each independently C1-C6 straight, branched or cyclic alkyl, R3 and R4 may bond together to form a ring with the carbon atom to which they are attached, X1 and X2 are each independently a single bond or ester group, m is 1 or 2, p and q each are 0 or 1, and r is an integer of 0 to 4,
- wherein RA is each independently hydrogen or methyl, R21 is a single bond, phenylene group, —O—R31−, or —C(═O)—Z1—R31—, Z1 is —O— or —NH—, R31 is a C1-C6 straight, branched or cyclic alkylene group, C2-C6 straight, branched or cyclic alkenylene group, or phenylene group, which may contain a carbonyl, ester, ether or hydroxyl moiety, Rf1 to Rf4 are each independently fluorine, hydrogen or trifluoromethyl, at least one of Rf1 to Rf4 being fluorine, R22 to R29 are each independently a C1-C12 straight, branched or cyclic alkyl group which may contain a carbonyl, ester or ether moiety, C6-C12 aryl group, C7-C20 aralkyl group, or mercaptophenyl group, Y1 is a single bond or a C1-C12 linking group which may contain an ester, ether moiety or lactone ring, Y2 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—R32—, or —C(═O)—Z2—R32—, Z2 is —O— or —NH—, R32 is a C1-C6 straight, branched or cyclic alkylene group, C2-C6 straight, branched or cyclic alkenylene group, or phenylene group, which may contain a carbonyl, ester, ether or hydroxyl moiety, and M− is a non-nucleophilic counter ion.
A negative resist composition comprising a base resin consisting essentially of recurring units having the formula (a), recurring units having the formula (b), recurring units having the formula (c), recurring units of at least one type selected from recurring units having the formulae (f1) to (f3), and optionally recurring units (d) having an adhesive group selected from among lactone ring and cyano groups, the polymer having a weight average molecular weight of 1,000 to 500,000,
- wherein RA is each independently hydrogen or methyl, R1 is hydroxyl, C1-C4 straight or branched alkyl, C1-C4 straight or branched alkoxy, acetoxy, or halogen, R2 and R5 are each independently C1-C4 straight or branched alkyl or halogen, R3 and R4 are each independently C1-C6 straight, branched or cyclic alkyl, R3 and R4 may bond together to form a ring with the carbon atom to which they are attached, X1 and X2 are each independently a single bond or ester group, m is 1 or 2, p and q each are 0 or 1, and r is an integer of 0 to 4,
- wherein RA is each independently hydrogen or methyl, R21 is a single bond, phenylene group, —O—R31—, or —C(═O)—Z1—R31—, Z1 is —O— or —NH—, R31 is a C1-C6 straight, branched or cyclic alkylene group, C2-C6 straight, branched or cyclic alkenylene group, or phenylene group, which may contain a carbonyl, ester, ether or hydroxyl moiety, Rf1 to Rf4 are each independently fluorine, hydrogen or trifluoromethyl, at least one of Rf1 to Rf4 being fluorine, R22 to R29 are each independently a C1-C12 straight, branched or cyclic alkyl group which may contain a carbonyl, ester or ether moiety, C6-C12 aryl group, C7-C20 aralkyl group, or mercaptophenyl group, Y1 is a single bond or a C1-C12 linking group which may contain an ester, ether moiety or lactone ring, Y2 is a single bond, methylene, ethylene, phenylene, fluorinated phenylene, —O—R32—, or —C(═O)—Z2—R32—, Z2 is —O— or —NH—, R32 is a C1-C6 straight, branched or cyclic alkylene group, C2-C6 straight, branched or cyclic alkenylene group, or phenylene group, which may contain a carbonyl, ester, ether or hydroxyl moiety, and M− is a non-nucleophilic counter ion.
Dependencies are inferred from the claim text.