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US 10,377,643 B1Granted
Ultraviolet disinfection system
AssigneeRayVio Corporation
InventorsDouglas A. Collins, Yitao Liao, Robert S. West
Life of this patent
Estimating the term…
Abstract
Embodiments of the invention include an elongate chamber. A UV source includes a semiconductor device, the semiconductor device including an active layer disposed between an n-type region and a p-type region. The active layer emits radiation having a peak wavelength in a UV range. The semiconductor device is positioned on a wall of the elongate chamber. An inner surface of the elongate chamber is reflective.
Claims17
A structure comprising:
- an elongated chamber for holding a fluid, the chamber having a sidewall generally parallel with a flow of the fluid through the chamber;
- a ultraviolet light emitting diode (UVLED) disposed along the sidewall of the chamber, the UVLED comprising a semiconductor device comprising an active layer that emits radiation having a peak wavelength in an ultraviolet range disposed between an n-type region and a p-type region;
- and
- an optic disposed over a major surface of the UVLED such that the optic is in contact with the fluid, wherein the optic comprises a lens.
1 more element
A structure comprising:
- an elongated chamber for holding a fluid, the chamber having a sidewall generally parallel with a flow of the fluid through the chamber;
- a ultraviolet light emitting diode (UVLED) disposed along the sidewall of the chamber, the UVLED comprising a semiconductor device comprising an active layer that emits radiation having a peak wavelength in an ultraviolet range disposed between an n-type region and a p-type region;
- a sealed compartment positioned on the sidewall of the chamber, wherein the UVLED is disposed within the sealed compartment, the sealed compartment comprising first sidewalls and a lens, wherein the lens is in direct contact with the fluid, and wherein the sealed compartment isolates and protects the UVLED from the fluid.
Dependencies are inferred from the claim text.