# US 10,374,190 B2 · Sealing film, organic electroluminescent display, and organic semiconductor device

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- Number: US 10,374,190 B2
- Document ID: US10374190B2
- Status: Granted
- Kind: B2
- Application number: 15/108,138
- Filed: 2014-12-25
- Published: 2016-11-24
- Granted: 2019-08-06
- Earliest claimed: 2013-12-26
- Assignees: Zeon Corporation
- Applicants: Zeon Corporation
- Inventors: Satoshi Tazaki; Hiroyasu Inoue; Atsushi Ishiguro; Yohei Koide
- Web page: https://patentgrep.com/patent/US10374190B2

## CPC

- B32B 7/12: using interposed adhesives or interposed materials with bonding properties
- B32B 3/08: characterised by added members at particular parts {(layer formed of separate pieces of material which are juxtaposed side-by-side B32B3/14, B32B3/18)}
- B32B 7/04: Interconnection of layers
- B32B 7/10: at least one layer having inter-reactive properties
- B32B 27/08: of synthetic resin
- B32B 27/28: comprising synthetic resins not wholly covered by any one of the sub-groups {B32B27/30 - B32B27/42}
- B32B 27/302: {comprising aromatic vinyl (co)polymers, e.g. styrenic (co)polymers}
- B32B 27/32: comprising polyolefins {(comprising vinyl (co)polymers or acrylic (co)polymers B32B27/30)}
- G02B 5/3083: {Birefringent or phase retarding elements (G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001)}
- H10D 30/67: Thin-film transistors [TFT] {(Stacked nanowire, nanosheet or nanoribbon FETs H10D30/501)}
- H10D 86/451: {characterised by the compositions or shapes of the interlayer dielectrics}
- H10D 86/60: wherein the TFTs are in active matrices
- H10K 59/871: {Self-supporting sealing arrangements}
- H10K 59/8791: {Arrangements for improving contrast, e.g. preventing reflection of ambient light}
- B32B 2250/03: 3 layers
- B32B 2307/40: having particular optical properties
- B32B 2307/416: Reflective
- B32B 2307/418: Refractive
- B32B 2307/42: Polarizing, birefringent, filtering
- B32B 2307/51: Elastic
- B32B 2307/54: Yield strength; Tensile strength
- B32B 2405/00: Adhesive articles, e.g. adhesive tapes
- B32B 2457/20: Displays, e.g. liquid crystal displays, plasma displays
- B32B 2457/206: Organic displays, e.g. OLED
- B32B 2581/00: Seals; Sealing equipment; Gaskets
- B32B: LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES

## Abstract

A sealing film including a substrate film, a sealing layer, and an adhesive layer in this order, wherein the sealing film has a tensile elastic modulus of equal to or higher than 1,000 MPa, and retardation of a layer portion provided at the sealing layer side relative to the substrate film in the sealing film after sealing is equal to or smaller than 20 nm.

## Claims

### Claim 1

A sealing film comprising a substrate film, a sealing layer, and an adhesive layer in this order, wherein
the sealing film has a tensile elastic modulus of equal to or higher than 1,000 MPa,
retardation of a layer portion provided at the sealing layer side relative to the substrate film in the sealing film after sealing is equal to or smaller than 20 nm,
the substrate film is a resin film, and the resin forming the substrate film is a thermoplastic resin, and
the sealing layer is made of an inorganic material.

### Claim 2 (depends on 1)

The sealing film according to claim 1, wherein the adhesive layer contains a hydrogenated block copolymer elastomer.

### Claim 3 (depends on 2)

The sealing film according to claim 2, wherein
the hydrogenated block copolymer elastomer is hydride formed by hydrogenating equal to or higher than 90% of all unsaturated bonds of a block copolymer,
the block copolymer has two or more polymer blocks [A] per molecule of the copolymer, and one or more polymer blocks [B] per molecule of the copolymer, the block [A] having as a main component an aromatic vinyl compound unit, and the block [B] having as a main component a linear conjugated diene compound unit, and
a ratio (wA/wB) between a weight fraction wA of all the polymer blocks [A] and a weight fraction wB of all the polymer blocks [B] in the entire block copolymer is 20/80 to 60/40.

### Claim 4 (depends on 1)

The sealing film according to claim 1, wherein the resin forming the substrate film is an alicyclic olefin resin.

### Claim 5 (depends on 1)

An organic electroluminescent display device comprising the sealing film according to claim 1.

### Claim 6 (depends on 1)

An organic semiconductor device comprising the sealing film according to claim 1.

### Claim 7 (depends on 2)

An organic electroluminescent display device comprising the sealing film according to claim 2.

### Claim 8 (depends on 2)

An organic semiconductor device comprising the sealing film according to claim 2.

### Claim 9 (depends on 3)

An organic electroluminescent display device comprising the sealing film according to claim 3.

### Claim 10 (depends on 3)

An organic semiconductor device comprising the sealing film according to claim 3.

### Claim 11 (depends on 4)

An organic electroluminescent display device comprising the sealing film according to claim 4.

### Claim 12 (depends on 4)

An organic semiconductor device comprising the sealing film according to claim 4.

### Claim 13 (depends on 1)

The sealing film according to claim 1, wherein the resin forming the substrate film is a resin selected from a group consisting of a polyester resin, a polyacrylate resin, and an olefin resin.

### Claim 14 (depends on 1)

The sealing film according to claim 1, wherein the water vapor permeability of the sealing layer is equal to or lower than 1.0 g/m2·day.

### Claim 15 (depends on 1)

The sealing film according to claim 1, wherein the sealing film has a tensile elastic modulus of equal to or lower than 4,000 MPa.

### Claim 16 (depends on 1)

The sealing film according to claim 1, wherein the inorganic material is one or more materials selected from the group consisting of metals, metal oxides, metal nitrides, metal oxynitrides, silicon oxides, silicon nitrides, and silicon oxynitrides.