# US 10,374,157 B2 · Mask for deposition, method of manufacturing mask, and method of manufacturing display device

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- Number: US 10,374,157 B2
- Document ID: US10374157B2
- Status: Granted
- Kind: B2
- Application number: 15/677,119
- Filed: 2017-08-15
- Published: 2018-05-31
- Granted: 2019-08-06
- Earliest claimed: 2016-11-25
- Assignees: Samsung Display Co., Ltd.
- Applicants: Samsung Display Co., Ltd.
- Inventors: Jeongkuk Kim; Minho Moon; Youngmin Moon
- Web page: https://patentgrep.com/patent/US10374157B2

## CPC

- C23C 14/042: {using masks}
- H10K 71/166: {using selective deposition, e.g. using a mask}
- H10P 14/272: {using mask materials other than SiO2 or SiN}
- H10K 59/12: Active-matrix OLED [AMOLED] displays
- H10K 71/164: {using vacuum deposition}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)
- H10K: ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

A mask for deposition, a method of manufacturing a mask for deposition, and a method of manufacturing a display device, the mask for deposition being coupleable to a frame with tensile force applied to opposite ends of the mask in a first direction and including a first rib portion having a first thickness; and a pattern portion including a plurality of pattern holes through which a deposition material is transmittable, and at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes.

## Claims

### Claim 1

A mask for deposition, the mask comprising:
a first rib portion having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and directly connecting some of the plurality of pattern holes,
wherein some of the plurality of pattern holes are disposed in a rhombus shape.

### Claim 2 (depends on 1)

The mask as claimed in claim 1, wherein the pattern portion further includes at least one pattern recess having a third thickness that is less than the second thickness.

### Claim 3 (depends on 2)

The mask as claimed in claim 2, wherein:
the at least one pattern recess includes a plurality of pattern recesses, and
the plurality of pattern recesses are disposed in a rhombus shape.

### Claim 4 (depends on 2)

The mask as claimed in claim 2, wherein:
the at least one pattern recess includes a plurality of pattern recesses, and
each pattern hole is between adjacent pattern recesses from among the plurality of pattern recesses.

### Claim 5 (depends on 1)

The mask as claimed in claim 1, wherein:
the at least one etch portion includes a plurality of etch portions, and
the plurality of etch portions are spaced apart from each other in a first direction.

### Claim 6 (depends on 1)

The mask as claimed in claim 1, wherein:
the at least one etch portion includes a plurality of etch portions extending along a first direction, and
the plurality of etch portions are spaced apart from each other in a second direction crossing the first direction.

### Claim 7 (depends on 1)

The mask of claim 1, wherein the at least one etch portion includes:
a first etch portion extending along a first direction; and
a second etch portion extending along a second direction that crosses the first direction.

### Claim 8 (depends on 7)

The mask as claimed in claim 7, wherein the first etch portion crosses the second etch portion.

### Claim 9 (depends on 1)

The mask as claimed in claim 1, wherein the at least one etch portion has a zigzag shape extending along a first direction or a second direction that crosses the first direction.

### Claim 10 (depends on 9)

The mask as claimed in claim 9, wherein the plurality of pattern holes are disposed at vertices of the zigzag shape.

### Claim 11 (depends on 1)

The mask as claimed in claim 1, wherein the pattern portion has a thickness that is equal to or less than the first thickness.

### Claim 12 (depends on 1)

The mask as claimed in claim 1, wherein the pattern portion includes a second rib portion in a region other than the plurality of pattern holes and the at least one etch portion, the second rib portion having a thickness that is greater than the second thickness of the at least one etch portion.

### Claim 13

A method of manufacturing a display device by using a mask for deposition, the method comprising:
inserting a display substrate and the mask for deposition into a chamber; and
depositing a deposition material over the display substrate, the deposition material being sprayed from a deposition source and passing through the mask for deposition,
wherein the mask for deposition includes:
a first rib having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes, and
wherein some of the plurality of pattern holes are disposed in a rhombus shape.

### Claim 14 (depends on 13)

The method as claimed in claim 13, wherein the pattern portion further includes at least one pattern recess having a third thickness that is less than the second thickness.

### Claim 15 (depends on 14)

The method as claimed in claim 14, wherein:
the at least one pattern recess includes a plurality of pattern recesses, and
the plurality of pattern recesses are arranged in a rhombus shape.

### Claim 16 (depends on 14)

The method as claimed in claim 14, wherein:
the at least one pattern recess includes a plurality of pattern recesses, and
each pattern hole is disposed between adjacent pattern recesses from among the plurality of pattern recesses.

### Claim 17 (depends on 13)

The method as claimed in claim 13, wherein:
the at least one etch portion includes a plurality of etch portions, and
the plurality of etch portions are spaced apart from each other in a first direction.

### Claim 18 (depends on 13)

The method as claimed in claim 13, wherein:
the at least one etch portion includes a plurality of etch portions, and
the plurality of etch portions are spaced apart from each other in a second direction crossing a first direction.

### Claim 19 (depends on 13)

The method as claimed in claim 13, wherein the at least one etch portion includes:
a first etch portion extending along a first direction; and
a second etch portion extending along a second direction that crosses the first direction.

### Claim 20 (depends on 19)

The method as claimed in claim 19, wherein the first etch portion crosses the second etch portion.

### Claim 21 (depends on 13)

The method as claimed in claim 13, wherein the at least one etch portion has a zigzag shape extending along a first direction or a second direction that crosses the first direction.

### Claim 22 (depends on 21)

The method as claimed in claim 21, wherein the plurality of pattern holes are disposed at vertices of the zigzag shape.

### Claim 23 (depends on 13)

The method as claimed in claim 13, wherein the pattern portion has a thickness that is equal to or less than the first thickness.

### Claim 24 (depends on 13)

The method as claimed in claim 13, wherein the pattern portion includes a second rib portion in a region other than the pattern hole and the etch portion, the second rib portion having a thickness that is greater than the second thickness of the at least one etch portion.

### Claim 25

A method of manufacturing a display device by using a mask for deposition, the method comprising:
inserting a display substrate and the mask for deposition into a chamber; and
depositing a deposition material over the display substrate, the deposition material being sprayed from a deposition source and passing through the mask for deposition,
wherein the mask for deposition includes:
a first rib having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes, and
wherein the at least one etch portion has a zigzag shape extending along a first direction or a second direction that crosses the first direction.

### Claim 26

A mask for deposition, the mask comprising:
a first rib portion having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes,
wherein the at least one etch portion has a zigzag shape extending along a first direction or a second direction that crosses the first direction.

### Claim 27

A mask for deposition, the mask comprising:
a first rib portion having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes,
wherein the at least one etch portion includes:
a first etch portion extending along a first direction; and
a second etch portion extending along a second direction that crosses the first direction, wherein the first etch portion crosses the second etch portion.

### Claim 28

A method of manufacturing a display device by using a mask for deposition, the method comprising:
inserting a display substrate and the mask for deposition into a chamber; and
depositing a deposition material over the display substrate, the deposition material being sprayed from a deposition source and passing through the mask for deposition,
wherein the mask for deposition includes:
a first rib having a first thickness; and
a pattern portion including:
a plurality of pattern holes, and
at least one etch portion, the at least one etch portion having a second thickness that is less than the first thickness and connecting between some of the plurality of pattern holes, and
wherein the at least one etch portion includes:
a first etch portion extending along a first direction; and
a second etch portion extending along a second direction that crosses the first direction, wherein the first etch portion crosses the second etch portion.