# US 10,374,114 B2 · Lateral single-photon avalanche diode and method of producing a lateral single-photon avalanche diode

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 10,374,114 B2
- Document ID: US10374114B2
- Status: Granted
- Kind: B2
- Application number: 14/777,484
- Filed: 2014-03-11
- Published: 2016-02-04
- Granted: 2019-08-06
- Earliest claimed: 2013-03-15
- Assignees: Ams AG
- Applicants: ams AG
- Inventors: Jordi Teva; Frederic Roger; Ewald Stueckler; Stefan Jessenig; Rainer Minixhofer; Ewald Wachmann; Martin Schrems; Guenther Koppitsch
- Web page: https://patentgrep.com/patent/US10374114B2

## CPC

- H10F 30/225: the potential barrier working in avalanche mode, e.g. avalanche photodiodes
- H10F 71/1221: {comprising polycrystalline silicon}
- H10F 77/148: {Shapes of potential barriers}
- H10F 77/1642: {including only Group IV materials}
- H10F 77/206: {for devices having potential barriers}
- Y02E 10/50: Photovoltaic [PV] energy
- H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- Y02E: REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION

## Abstract

The lateral single-photon avalanche diode comprises a semiconductor body comprising a semiconductor material of a first type of electric conductivity, a trench in the semiconductor body, and anode and cathode terminals. A junction region of the first type of electric conductivity is located near the sidewall of the trench, and the electric conductivity is higher in the junction region than at a farther distance from the sidewall. A semiconductor layer of an opposite second type of electric conductivity is arranged at the sidewall of the trench adjacent to the junction region. The anode and cathode terminals are electrically connected with the semiconductor layer and with the junction region, respectively. The junction region may be formed by a sidewall implantation.

## Claims

### Claim 1

A lateral single-photon avalanche diode, comprising:
a semiconductor body comprising a semiconductor material of a first type of electric conductivity;
a trench having a sidewall arranged in the semiconductor body;
anode and cathode terminals,
wherein the semiconductor material comprises a junction region of the first type of electric conductivity near the sidewall of the trench, and the electric conductivity is higher in the junction region than at a farther distance from the sidewall; and
a semiconductor layer of an opposite second type of electric conductivity arranged at the sidewall of the trench directly adjacent to the junction region,
wherein the anode and cathode terminals are electrically connected with the semiconductor layer and with the junction region, respectively,
wherein a plane upper surface of the semiconductor body is present outside the trench, and a counterdoped region of the first type of electric conductivity separates the junction region and the semiconductor layer of the second type of electric conductivity from the plane upper surface,
wherein the trench intersects the plane upper surface of the semiconductor body,
wherein the semiconductor layer and the junction region form a pn-junction with one another, and
wherein the anode and cathode terminals and the counterdoped region extend to the plane upper surface.

### Claim 2 (depends on 1)

The lateral single-photon avalanche diode according to claim 1, wherein the semiconductor layer is a doped polysilicon layer.

### Claim 3 (depends on 1)

The lateral single-photon avalanche diode according to claim 1, wherein the semiconductor layer is a doped region of the semiconductor body adjacent to the sidewall of the trench.

### Claim 4 (depends on 1)

The lateral single-photon avalanche diode according to claim 1, wherein the junction region is at a distance from the plane upper surface.

### Claim 5 (depends on 1)

The lateral single-photon avalanche diode according to claim 1, further comprising:
a contact well of the first type of electric conductivity arranged in the semiconductor body, the contact well providing one of the anode and cathode terminals.

### Claim 6 (depends on 1)

The lateral single-photon avalanche diode according to claim 1, further comprising:
a further trench arranged at a distance from the trench, the further trench comprising one of the anode and cathode terminals.

### Claim 7 (depends on 6)

The lateral single-photon avalanche diode according to claim 6, wherein the trench is deeper than the further trench.

### Claim 8 (depends on 6)

The lateral single-photon avalanche diode according to claim 6, wherein the anode and cathode terminals are formed by electrically conductive fillings in the trench and in the further trench.
