# US 10,373,859 B2 · Support ring with masked edge > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,373,859 B2 - Document ID: US10373859B2 - Status: Granted - Kind: B2 - Application number: 16/029,159 - Filed: 2018-07-06 - Published: 2018-11-01 - Granted: 2019-08-06 - Earliest claimed: 2013-12-31 - Assignees: Applied Materials, Inc. - Applicants: Applied Materials, Inc. - Inventors: Mehran Behdjat; Norman L. Tam; Aaron Muir Hunter; Joseph M. Ranish; Koji Nakanishi; Toshiyuki Nakagawa - Web page: https://patentgrep.com/patent/US10373859B2 ## CPC - H10P 72/7616: {characterised by a coating, a hardness or a material} - C23C 16/50: using electric discharges {(generation and control of plasma in discharge tubes for surface treatment H01J37/32, H01J37/34)} - H10P 72/0436: {mainly by radiation} - H10P 72/7611: {characterised by edge profile or support profile} - H10P 72/70: for supporting or gripping - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract A support ring for semiconductor processing is provided. The support ring includes a ring shaped body defined by an inner edge and an outer edge. The inner edge and outer edge are concentric about a central axis. The ring shaped body further includes a first side, a second side, and a raised annular shoulder extending from the first side of the ring shaped body at the inner edge. The support ring also includes a coating on the first side. The coating has an inner region of reduced thickness region abutting the raised annular shoulder. ## Claims ### Claim 1 A support ring for semiconductor processing, comprising: a ring shaped body comprising: an inner edge and an outer edge; a first side and a second side; a shoulder extending from the first side of the ring shaped body; and a rim extending from the second side of the ring shaped body; and a coating deposited on the first side of the ring shaped body, the coating having a thickness of at least 25 microns. ### Claim 2 (depends on 1) The support ring of claim 1, wherein the ring shaped body comprises quartz. ### Claim 3 (depends on 1) The support ring of claim 1, wherein the coating comprises a silicon containing material. ### Claim 4 (depends on 3) The support ring of claim 3, wherein the silicon containing material is polysilicon. ### Claim 5 (depends on 1) The support ring of claim 1, wherein an inner region of the coating has a uniform thickness and an outer region of the coating has a uniform thickness. ### Claim 6 (depends on 1) The support ring of claim 1, wherein the coating extends from the shoulder to the outer edge. ### Claim 7 (depends on 1) The support ring of claim 1, wherein the shoulder extends from the ring shaped body at the inner edge. ### Claim 8 (depends on 1) The support ring of claim 1, wherein the rim extends from the ring shaped body at the outer edge. ### Claim 9 A support ring for semiconductor processing, comprising: a ring shaped body comprising: an inner edge and an outer edge; a first side and a second side; an annular shoulder extending from the first side of the ring shaped body at the inner edge; and a rim extending from the second side of the ring shaped body at the outer edge; and a coating on the first side of the ring shaped body between the outer edge and the annular shoulder. ### Claim 10 (depends on 9) The support ring of claim 9, wherein the ring shaped body comprises quartz. ### Claim 11 (depends on 9) The support ring of claim 9, wherein the coating is polysilicon. ### Claim 12 (depends on 9) The support ring of claim 9, wherein an inner region of the coating has a uniform thickness and an outer region of the coating has a uniform thickness. ### Claim 13 (depends on 9) The support ring of claim 9, wherein a top surface of an inner region of the coating and a top surface of an outer region of the coating are substantially parallel to a bottom surface of the ring shaped body. ### Claim 14 (depends on 9) The support ring of claim 9, wherein the coating abuts the annular shoulder. ### Claim 15 A support ring for semiconductor processing, comprising: a ring shaped body comprising: an inner edge and an outer edge; a first side and a second side; a shoulder extending from the first side of the ring shaped body at the inner edge; and a rim extending from the second side of the ring shaped body; and a coating on the first side of the ring shaped body between the outer edge and the shoulder, the coating abutting the shoulder. ### Claim 16 (depends on 15) The support ring of claim 15, wherein the coating comprises a silicon containing material. ### Claim 17 (depends on 16) The support ring of claim 16, wherein the silicon containing material is polysilicon. ### Claim 18 (depends on 15) The support ring of claim 15, wherein the ring shaped body comprises quartz. ### Claim 19 (depends on 15) The support ring of claim 15, wherein a top surface of an inner region of the coating and a top surface of an outer region of the coating are substantially parallel to a bottom surface of the ring shaped body. ### Claim 20 (depends on 15) The support ring of claim 15, wherein an inner region of the coating has a uniform thickness and an outer region of the coating has a uniform thickness.