# US 10,373,830 B2 · Apparatus and methods to remove unbonded areas within bonded substrates using localized electromagnetic wave annealing

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- Number: US 10,373,830 B2
- Document ID: US10373830B2
- Status: Granted
- Kind: B2
- Application number: 15/452,005
- Filed: 2017-03-07
- Published: 2017-09-14
- Granted: 2019-08-06
- Earliest claimed: 2016-03-08
- Assignees: Ostendo Technologies, Inc.
- Applicants: Ostendo Technologies, Inc.
- Inventors: Hussein S. El-Ghoroury; Minghsuan Liu; Kameshwar Yadavalli; Weilong Tang; Benjamin A. Haskell; Hailong Zhou
- Web page: https://patentgrep.com/patent/US10373830B2

## CPC

- H10P 10/128: {by direct semiconductor to semiconductor bonding}
- H10P 34/00: Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
- H10P 72/0436: {mainly by radiation}
- H10P 72/7618: {characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel}
- H10P 90/1914: {using bonding}
- H10W 10/181: {Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers}
- H10P 74/203: {Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10

## Abstract

An electromagnetic wave irradiation apparatus and methods to bond unbonded areas in a bonded pair of substrates are disclosed. The unbonded areas between the substrates are eliminated by thermal activation in the unbonded areas induced by electromagnetic wave irradiation having a wavelength selected to effect a phonon or electron excitation. A first substrate of the bonded pair of substrates absorbs the electromagnetic radiation and a portion of a resulting thermal energy transfers to an interface of the bonded pair of substrates at the unbonded areas with sufficient flux to cause opposite sides the first and second substrates to interact and dehydrate to form a bond (e.g., Si—O—Si bond).

## Claims

### Claim 1

A method for eliminating an unbonded region of a partially-bonded substrate pair, the method comprising:
generating, by an electromagnetic wave source, an electromagnetic wave beam having a wavelength; and
focusing, by an optical component, the electromagnetic wave beam from the electromagnetic wave source onto a surface of a first substrate or a second substrate to generate thermal energy locally on and irradiate the surface, the first substrate being partially-bonded to the second substrate forming a bonded substrate pair and defining at least one unbonded region at a bond interface of the bonded substrate pair;
whereby the thermal energy from the irradiated surface is transferred to the bond interface and the unbonded region at the bond interface and further through to the non-irradiated substrate to cause a phonon or electron excitation of the first and second substrates that absorb the thermal energy, the absorbed thermal energy activating the first and second substrates causing opposite sides of the unbonded region to form one or more bonds, thereby eliminating the unbonded region.

### Claim 2 (depends on 1)

The method of claim 1, further comprising:
controlling movement of the bonded substrate pair by a stage while focusing the electromagnetic wave beam onto the surface of the at least one of the first substrate and second substrate so as to generate a scan pattern on the surface, wherein the stage is configured to hold the bonded substrate pair.

### Claim 3 (depends on 2)

The method of claim 2, further comprising:
directing, by an optical fiber, the electromagnetic wave beam from the electromagnetic wave source into the optical component.

### Claim 4 (depends on 2)

The method of claim 2, wherein the stage comprises a first motor assembly and a second motor assembly that control in-plane movement of the bonded substrate pair on the stage, and control localized thermal activation of the bonded substrate pair.

### Claim 5 (depends on 4)

The method of claim 4, wherein the first motor assembly and the second motor assembly are coupled to a computer configured with software for controlling the first and second motor assemblies.

### Claim 6 (depends on 4)

The method of claim 4, wherein the stage further controls vertical movement of the bonded substrate pair on the stage.

### Claim 7 (depends on 2)

The method of claim 2, wherein the scan pattern comprises a circle, spiral, or raster scan pattern irradiation.

### Claim 8 (depends on 1)

The method of claim 1, wherein the optical component is an optical lens, a magnetic lens, a micromirror device, or an optical microscope.

### Claim 9 (depends on 1)

The method of claim 1, wherein the wavelength is a wavelength of visible light, infrared, ultraviolet, microwave, radio frequency, or X-ray.

### Claim 10 (depends on 1)

The method of claim 1, wherein beam size of the electromagnetic wave beam is 5 microns, 5 millimeters or 10 millimeters.

### Claim 11 (depends on 1)

The method of claim 1, wherein a ratio between (a) a product of a Planck constant and speed of light, and (b) the wavelength is greater than a band gap of a material of the first substrate or second substrate.

### Claim 12

A method for bonding an unbonded region of a partially-bonded substrate pair, the method comprising:
generating electromagnetic radiation having a wavelength;
focusing the electromagnetic radiation onto a surface of a first substrate or a second substrate to generate thermal energy locally on and irradiate the surface, the first substrate being partially-bonded to the second substrate forming a bonded substrate pair and defining at least one incomplete bonded area at a bond interface of the bonded substrate pair; and
controlling movement of the bonded substrate pair while focusing the electromagnetic radiation onto the surface so as to generate a scan pattern on the surface;
wherein the wavelength is selected to effect a phonon or electron excitation within the bonded substrate pair;
whereby a portion of the thermal energy from the irradiated surface is transferred to the bond interface of the bonded substrate pair and the incomplete bonded area at the bond interface and further through to the non-irradiated substrate to cause the phonon or electron excitation of the first and second substrates that absorb the thermal energy, the absorbed thermal energy activating the first and second substrates causing opposite sides of the incomplete bonded area to form one or more bonds, thereby eliminating the incomplete bonded area.

### Claim 13 (depends on 12)

The method of claim 12, wherein controlling movement of the bonded substrate pair comprises controlling in-plane movement of the bonded substrate pair.

### Claim 14 (depends on 12)

The method of claim 12, wherein OH— groups on the opposite sides of the interface interact and dehydrate to form the bond(s), wherein the bond(s) is/are Si—O—Si bond(s).

### Claim 15 (depends on 12)

The method of claim 12, wherein each of the first and second substrates is amorphous, partly crystalline, crystalline, or a combination thereof.

### Claim 16 (depends on 12)

The method of claim 12, wherein the first and second substrates are formed with a different group of materials.

### Claim 17 (depends on 12)

The method of claim 12, wherein the first and second substrates are formed with same material.

### Claim 18 (depends on 12)

The method of claim 12, wherein a ratio between (a) a product of a Planck constant and speed of light, and (b) the wavelength is greater than a band gap of a material of the first substrate or second substrate.

### Claim 19 (depends on 12)

The method of claim 12, wherein a thermal excitation of molecules or atoms of at least one of the first and second substrates is effected in the at least one incomplete bonded area of the bond interface by the generated electromagnetic radiation.

### Claim 20 (depends on 12)

The method of claim 12, wherein the electromagnetic radiation is a pulsed or continuous wave radiation.