# US 10,373,792 B2 · Cathode assembly for use in X-ray generation > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,373,792 B2 - Document ID: US10373792B2 - Status: Granted - Kind: B2 - Application number: 15/195,654 - Filed: 2016-06-28 - Published: 2017-12-28 - Granted: 2019-08-06 - Earliest claimed: 2016-06-28 - Assignees: General Electric Company - Applicants: General Electric Company - Inventors: John Scott Price; Xi Zhang - Web page: https://patentgrep.com/patent/US10373792B2 ## CPC - H01J 35/147: {Spot size control} - H01J 1/15: Cathodes heated directly by an electric current - H01J 35/064: {Details of the emitter, e.g. material or structure (H01J35/065 takes precedence)} - H01J 35/066: {Details of electron optical components, e.g. cathode cups} - H01J 35/153: {Spot position control} - H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H) ## Abstract A cathode assembly design is provided that includes two flat emitters, a longer emitter filament and a shorter emitter filament. In one implementation the focal spot sizes produced by the long and short emitters overlap over a range. Thus, one emitter filament may be suitable for generating small and concentrated focal spot sizes while the other emitter filament is suitable for generating small and large focal spots sizes. ## Claims ### Claim 1 A cathode assembly, comprising: at least two flat filaments each comprising an electron emissive surface when heated, wherein a first flat filament has an electron emissive area that is less than an electron emissive area of a second flat filament; a set of width bias electrodes positioned along a first dimension of the flat filaments, wherein the set of width bias electrodes controls the width of a focal spot generated by the flat filaments during operation; a set of length bias electrodes positioned along a second dimension of the flat filaments, wherein the set of length bias electrodes controls the length of the focal spot during operation; and a septum positioned between the first flat filament and the second flat filament, wherein the septum is at the same potential as the width bias electrodes during operation. ### Claim 2 (depends on 1) The cathode assembly of claim 1, wherein the first flat filament and the second flat filament have the same width and thickness but differ in an effective length of the respective electron emissive surfaces. ### Claim 3 (depends on 2) The cathode assembly of claim 2, wherein the first flat filament has a length less than the second flat filament. ### Claim 4 (depends on 1) The cathode assembly of claim 1, wherein the length bias electrodes comprise a notch region proximate to the second flat filament so that a greater emissive region of the second flat filament is exposed. ### Claim 5 (depends on 1) The cathode assembly of claim 1, wherein the septum is fixed at one or both ends of the septum to a width electrode support ring. ### Claim 6 (depends on 1) The cathode assembly of claim 1, further comprising a pair of grounded metal features disposed adjacent the electron emissive surface on each flat filament and running parallel to the width electrodes, wherein the pair of grounded metal features on each flat filament protrude or are elevated relative to the electron emissive surface of the respective flat filament. ### Claim 7 (depends on 6) The cathode assembly of claim 6, wherein the pairs of grounded metal features are at the same potential as the flat filaments during operation. ### Claim 8 (depends on 1) The cathode assembly of claim 1, wherein the at least two flat filaments are angled relative to one another such that the respective electron emissive surfaces of each filament are generally perpendicular to a focal spot location during operation. ### Claim 9 (depends on 1) The cathode assembly of claim 1, wherein the first flat filament is sized to generate focal spots on a target within a first size range and the second flat filament is sized to generate focal spots on the target in a second size range that partially overlaps with the first size range. ### Claim 10 An X-ray tube, comprising: an anode; and a cathode, comprising: a pair of flat filaments that emit electrons when heated, wherein a first flat filament is longer than a second flat filament of the pair of flat filaments; a pair of width bias electrodes positioned on opposite sides of the pair of flat filaments along a first dimension; a pair of length bias electrodes positioned on opposite sides of the pair of flat filaments along a second dimension perpendicular to the first dimension; and a septum positioned between the pair of flat filaments and running in the same direction as the pair of width bias electrodes, wherein the septum is at the same potential as the width bias electrodes during operation. ### Claim 11 (depends on 10) The X-ray tube of claim 10, further comprising, on each flat filament, a pair of grounded metal features disposed adjacent an electron emissive surface of each flat filament and running parallel to the width electrodes, wherein the pair of grounded metal features on each flat filament protrude or are elevated relative to the electron emissive surface of the respective flat filament. ### Claim 12 (depends on 11) The X-ray tube of claim 11, wherein the pairs of grounded metal features are at the same potential as the flat filaments during operation. ### Claim 13 (depends on 10) The X-ray tube of claim 10, wherein the first flat filament and the second flat filament are angled relative to one another such that electron emissive surfaces of each flat filament are directed toward a focal spot location on the anode during operation. ### Claim 14 (depends on 10) The X-ray tube of claim 10, wherein the first flat filament is sized to generate focal spots on the anode within a first size range and the second flat filament is sized to generate focal spots on the anode in a second size range that partially overlaps with the first size range. ### Claim 15 A method for generating an electron beam focal spot on a target, comprising: receiving an input specifying a size of the electron beam focal spot on the target; and selectively operating a first emitter filament or a second emitter filament of a cathode assembly to generate an electron beam focal spot of the size specified by the input on the target, wherein the first emitter filament and the second emitter filament differ in length, by: selecting the first emitter filament when the input specifies a first focal spot size; selecting the first emitter filament and the second emitter filament when the input specifies a second focal spot size; and selecting the second emitter filament when the input specified a third focal spot size wherein selecting the first emitter filament and the second emitter filament when the input specifies a second focal spot size comprises taking into account a failure of the first emitter filament or the second emitter filament so as to allow generation of the second focal spot size when one of the first emitter filament or the second emitter filament is inoperative.