# US 10,372,044 B2 · Substrate table, a lithographic apparatus and a device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,372,044 B2 - Document ID: US10372044B2 - Status: Granted - Kind: B2 - Application number: 15/856,133 - Filed: 2017-12-28 - Published: 2018-12-06 - Granted: 2019-08-06 - Earliest claimed: 2010-12-21 - Assignees: ASML Netherlands B.V. - Applicants: Asml Netherlands B.V. - Inventors: Nicolaas Ten Kate; Raymond Wilhelmus Louis Lafarre - Web page: https://patentgrep.com/patent/US10372044B2 ## CPC - G03F 7/70716: {Stages} - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface. ## Claims ### Claim 1 A table for a lithographic apparatus, the table comprising: a support region having a protrusion to support to an object; a catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the support region, and an outer structure of the table; a drain opening configured to receive liquid that passes through the catchment opening; a protruding structure protruding from a surface of the table, the protruding structure configured to substantially prevent liquid in the passage from entering a space between the object and/or outer structure, when supported on the table, and a part of the table, wherein the protruding structure defines at least in part the catchment opening; a passage that extends from the catchment opening to below the surface and terminates at the drain opening, the passage having a uniform width from the catchment opening to the termination at the drain opening; and a porous structure in the passage to receive liquid that passes through the gap. ### Claim 2 (depends on 1) The table of claim 1, wherein the outer structure comprises a plate removably supported on a protrusion of the table. ### Claim 3 (depends on 2) The table of claim 2, wherein the plate covers over at least part of the width of the catchment opening. ### Claim 4 (depends on 2) The table of claim 2, comprising a protruding structure configured to substantially prevent liquid in the passage from entering a space between the plate, when supported on the table, and a part of the table. ### Claim 5 (depends on 1) The table of claim 1, wherein the drain opening has a smaller width than the width of the passage. ### Claim 6 (depends on 1) The table of claim 1, wherein the porous structure is configured to stop liquid flow and accumulate liquid above the porous structure. ### Claim 7 (depends on 1) The table of claim 1, further comprising an underpressure generator configured to generate an underpressure at the drain opening. ### Claim 8 (depends on 1) A lithographic apparatus, comprising: a projection system configured to project a beam of radiation through a liquid onto a substrate; a liquid supply system configured to supply a liquid to a region between the projection system and the substrate; the table of claim 1. ### Claim 9 A table for a lithographic apparatus, the table comprising: a support region having a protrusion to support to an object; a catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the support region, and a plate removably mounted on an upper surface of the table; a drain opening configured to receive liquid that passes through the catchment opening; a protruding structure protruding from a surface of the table, the protruding structure configured to substantially prevent liquid in the passage from entering a space between the object and/or plate, when supported on the table, and a part of the table, wherein the protruding structure defines at least in part the catchment opening; a passage that extends from the catchment opening to below the surface and terminates at the drain opening, the passage having a uniform width from the catchment opening to the termination at the drain opening; and a porous structure to receive liquid that passes through the gap, the porous structure having an upper surface lower than a bottom surface of the object, when supported on the support region. ### Claim 10 (depends on 9) The table of claim 9, wherein the plate is removably supported on a protrusion of the table. ### Claim 11 (depends on 9) The table of claim 9, wherein the plate covers over at least part of the width of the catchment opening. ### Claim 12 (depends on 9) The table of claim 9, wherein the drain opening has a smaller width than the width of the passage. ### Claim 13 (depends on 9) The table of claim 9, wherein the porous structure is configured to stop liquid flow and accumulate liquid above the porous structure. ### Claim 14 (depends on 9) The table of claim 9, further comprising an underpressure generator configured to generate an underpressure at the drain opening. ### Claim 15 (depends on 9) A lithographic apparatus, comprising: a projection system configured to project a beam of radiation through a liquid onto a substrate; a liquid supply system configured to supply a liquid to a region between the projection system and the substrate; the table of claim 9. ### Claim 16 A table for a lithographic apparatus, the table comprising: a catchment opening defined in a surface of the table, the catchment opening arranged to receive liquid that passes through a gap between the object, when supported on the table, and an outer structure of the table; a protruding structure configured to substantially prevent liquid from the catchment opening from entering a space between the object and/or outer structure, when supported on the table, and a part of the table; a porous structure to receive liquid that passes through the gap, the porous structure configured to stop liquid flow and accumulate liquid above the porous structure; and a drain opening configured to receive liquid that passes through the catchment opening. ### Claim 17 (depends on 16) The table of claim 16, wherein the outer structure comprises a plate removably supported on a protrusion of the table and the plate covers over at least part of the width of the catchment opening. ### Claim 18 (depends on 16) A lithographic apparatus, comprising: a projection system configured to project a beam of radiation through a liquid onto a substrate; a liquid supply system configured to supply a liquid to a region between the projection system and the substrate; the table of claim 16. ### Claim 19 (depends on 1) The table of claim 1, wherein the drain opening has a smaller cross-sectional dimension that the gap. ### Claim 20 (depends on 9) The table of claim 9, wherein the drain opening has a smaller cross-sectional dimension that the gap.