# US 10,372,042 B2 · Resolution enhanced digital lithography with anti-blazed DMD

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- Number: US 10,372,042 B2
- Document ID: US10372042B2
- Status: Granted
- Kind: B2
- Application number: 15/871,302
- Filed: 2018-01-15
- Published: 2018-07-26
- Granted: 2019-08-06
- Earliest claimed: 2017-01-20
- Assignees: Applied Materials, Inc.
- Applicants: Applied Materials, Inc.
- Inventors: Thomas L. Laidig; Hwan J. Jeong
- Web page: https://patentgrep.com/patent/US10372042B2

## CPC

- G03F 7/702: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems}
- G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices}
- G02B 26/0833: {the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B)}
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

## Abstract

Embodiments of the present disclosure generally relate to methods and apparatus for processing one or more substrates, and more specifically to improved spatial light modulators for digital lithography systems and digital lithography methods using improved spatial light modulators. The spatial light modulator is configured such that there is a 180-degree phase shift between adjacent spatial light modulator pixels. The spatial light modulator is useful for pixel blending by forming a plurality of partially overlapping images, at least one of the plurality of partially overlapping images having at least two pixels formed by a first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween. The spatial light modulator results in improved resolution, depth of focus, and pixel blending.

## Claims

### Claim 1

A digital lithography method, comprising:
forming a first image having at least two pixels on a substrate, wherein the at least two pixels correspond to a first pair of adjacent spatial light modulator pixels of a plurality of spatial light modulator pixels of a spatial light modulator, the first pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween; and
forming a second image having at least two pixels on the substrate, wherein the second image partially overlaps the first image.

### Claim 2 (depends on 1)

The method of claim 1, further comprising:
varying a voltage applied to the spatial light modulator, the voltage being selected to achieve the 180-degree phase shift between the first pair of adjacent spatial light modulator pixels.

### Claim 3 (depends on 1)

The method of claim 1, further comprising:
introducing a gas having a predetermined index of refraction into the spatial light modulator, the index of refraction being selected to achieve the 180-degree phase shift between the first pair of adjacent spatial light modulator pixels.

### Claim 4 (depends on 1)

The method of claim 1, wherein the at least two pixels of the second image correspond to a second pair of adjacent spatial light modulator pixels having a 180-degree phase shift therebetween.

### Claim 5 (depends on 1)

The method of claim 1, wherein the spatial light modulator is a digital micromirror device, and wherein the spatial light modulator pixels are tiltable micromirrors.

### Claim 6 (depends on 5)

The method of claim 5, further comprising:
positioning a first micromirror of the tiltable micromirrors at a first angle; and
positioning a second micromirror of the tiltable micromirrors adjacent to the first micromirror at a second angle, the first angle and the second angle being selected to achieve a 180-degree phase shift between the first micromirror and the second micromirror.