# US 10,372,035 B2 · Imprint apparatus, and method of manufacturing article > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,372,035 B2 - Document ID: US10372035B2 - Status: Granted - Kind: B2 - Application number: 15/471,043 - Filed: 2017-03-28 - Published: 2017-10-05 - Granted: 2019-08-06 - Earliest claimed: 2016-03-29 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: Takahiro Nakayama - Web page: https://patentgrep.com/patent/US10372035B2 ## CPC - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - B05D 3/06: by exposure to radiation (B05D3/02 takes precedence {; plasma treatment B05D3/141}) - B05D 3/12: by mechanical means - H10P 95/00: Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass - B05D 1/42: by non-rotary members - B05D 3/0466: {the gas being a non-reacting gas (B05D3/0406 takes precedence)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B05D: PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL (conveying articles or workpieces through baths of liquid B65G, e.g. B65G49/02) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract The present invention provides an imprint apparatus which forms a pattern of an imprint material on a substrate by using a mold, the apparatus comprising: a generator configured to generate ionized gas by ionizing a first gas; a supplier configured to supply a second gas including the ionized gas generated by the generator to a space under the mold; and a controller configured to control a flow rate of the second gas supplied by the supplier to the space, wherein the controller increases the flow rate of the second gas supplied from the supplier to the space so as to reduce a decrease in an ion concentration in the space caused by moving the substrate from the space after the mold is separated from the cured imprint material. ## Claims ### Claim 1 An imprint apparatus which forms a pattern on an imprint material on a substrate by using a mold, the apparatus comprising: a generator that generates ionized gas by ionizing a first gas; a supplier that supplies a second gas including the ionized gas generated by the generator to a space under the mold; and a controller that controls a flow rate of the second gas supplied by the supplier to the space, wherein the controller increases the flow rate of the second gas supplied from the supplier to the space so as to reduce a decrease in an ion concentration in the space caused by moving the substrate from the space after the mold is separated from the imprint material. ### Claim 2 (depends on 1) The apparatus according to claim 1, further comprising a detector that detects a pressure of the second gas supplied from the supplier to the space, wherein the controller increases the flow rate of the second gas supplied from the supplier to the space in response to the detector detecting a decrease in the pressure caused by moving the substrate from the space. ### Claim 3 (depends on 1) The apparatus according to claim 1, wherein the second gas includes a third gas for accelerating filling of a pattern with concave and convex portions formed in the mold with the imprint material. ### Claim 4 (depends on 3) The apparatus according to claim 3, further comprising an adjuster that adjusts the ion concentration of the second gas supplied from the supplier to the space, wherein the controller controls the adjuster so as to make the ion concentration of the second gas supplied from the supplier to the space in a contact process of bringing the mold and the imprint material into contact with each other lower than that in a process different from the contact process. ### Claim 5 (depends on 4) The apparatus according to claim 4, wherein the second gas further includes a fourth gas without being ionized and the adjuster adjusts the ion concentration of the second gas supplied from the supplier to the space by changing a mixing ratio of the ionized gas in the second gas. ### Claim 6 (depends on 4) The apparatus according to claim 4, wherein the generator generates the ionized gas by irradiating the first gas with an energy beam, and the adjuster includes a plate for blocking the energy beam and adjusts the ion concentration of the ionized gas supplied from the supplier to the space by changing an area of a portion of the plate arranged in an optical path of the energy beam. ### Claim 7 (depends on 6) The apparatus according to claim 6, wherein the plate has a plurality of openings different in size, and the adjuster changes the area by switching an opening, out of the plurality of openings, arranged in the optical path of the energy beam. ### Claim 8 (depends on 1) The apparatus according to claim 1, further comprising a holder that holds the mold, wherein the supplier supplies a gas from a supply port provided in the holder to the space. ### Claim 9 An imprint apparatus which forms a pattern on an imprint material on a substrate by using a mold, the apparatus comprising: a generator that generates ionized gas for accelerating filling of a pattern with concave and convex portions formed in the mold with the imprint material; a supplier that supplies a second gas including the ionized gas generated by the generator to a space under the mold; an adjuster that adjusts an ion concentration of the second gas supplied from the supplier to the space; and a controller that controls the adjuster so as to make the ion concentration of the second gas supplied from the supplier to the space in a contact process of bringing the mold and the imprint material into contact with each other lower than that in a process different from the contact process.