# US 10,372,034 B2 · Imprint apparatus, imprint method, and method for manufacturing article > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,372,034 B2 - Document ID: US10372034B2 - Status: Granted - Kind: B2 - Application number: 15/357,740 - Filed: 2016-11-21 - Published: 2017-05-25 - Granted: 2019-08-06 - Earliest claimed: 2015-11-24 - Assignees: Canon Kabushiki Kaisha - Applicants: Canon Kabushiki Kaisha - Inventors: Kazuki Nakagawa; Kazuhiro Sato; Tsutomu Terao - Web page: https://patentgrep.com/patent/US10372034B2 ## CPC - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - B29C 35/02: Heating or curing, e.g. crosslinking or vulcanizing {during moulding, e.g. in a mould}(cold vulcanisation B29C35/18 {; vulcanising tyres, presses therefor B29D30/0601}) - B29C 35/0288: {Controlling heating or curing of polymers during moulding, e.g. by measuring temperatures or properties of the polymer and regulating the process (controlling or regulating chemical, physical or physico- chemical processes in general B01J19/0006)} - B29C 35/08: by wave energy or particle radiation {(B29C64/00, B29C71/04 take precedence)} - B29C 35/0805: {using electromagnetic radiation} - B29C 35/0888: {using transparant moulds} - B29C 59/02: by mechanical means, e.g. pressing {(B29C59/007 takes precedence; embossing expanded porous articles B29C44/5627)} - B29C 59/022: {characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor} - B29C 59/026: {of layered or coated substantially flat surfaces} - B29C 59/16: by wave energy or particle radiation {, e.g. infrared heating (B29C59/007 takes precedence)} - B29C 2035/0827: {using UV radiation} - B29C 2059/023: {Microembossing} - B29K 2105/24: crosslinked or vulcanised - B29L 2031/34: Electrical apparatus, e.g. sparking plugs or parts thereof - G03F 7/20: Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B27/00) - G03F 7/2002: {with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image} - G03F 7/2012: {using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps} - G03F 7/70: {Microphotolithographic exposure; Apparatus therefor (photo-masks G03F1/00)} - G03F 7/70558: {Dose control, i.e. achievement of a desired dose} - G03F 7/70608: {Monitoring the unpatterned workpiece, e.g. measuring thickness, reflectivity or effects of immersion liquid on resist} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - B29K: INDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR {MOULDS, } REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS - B29L: INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES ## Abstract An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold includes a heating unit, a generation unit, and a measurement unit. The heating unit irradiates a region to be processed on the substrate with light to heat the region to be processed. The generation unit generates irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed. The measurement unit measures information about absorption of the light by the region to be processed. The generation unit generates the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit. ## Claims ### Claim 1 An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising: a heating unit configured to irradiate a region to be processed on the substrate with light to heat the region to be processed; a generation unit configured to generate irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit irradiates the region to be processed; and a measurement unit configured to measure information about absorption of the light by the region to be processed, wherein the generation unit is configured to generate the irradiation amount distribution data by correcting, using a result of measurement by the measurement unit, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit. ### Claim 2 (depends on 1) The imprint apparatus according to claim 1, wherein the measurement unit measures the information by receiving reflected light of the light reflected at the region to be processed. ### Claim 3 (depends on 2) The imprint apparatus according to claim 2, wherein the measurement unit measures the reflected light having passed through the mold. ### Claim 4 (depends on 2) The imprint apparatus according to claim 2, wherein a wavelength band of light which the measurement unit uses for measurement contains wavelengths of the light which the heating unit uses for heating. ### Claim 5 (depends on 1) The imprint apparatus according to claim 1, wherein the measurement unit measures the information by receiving radiated light from the region to be processed that is generated by irradiation of the region to be processed with the light. ### Claim 6 (depends on 1) The imprint apparatus according to claim 1, wherein the generation unit generates the irradiation amount distribution data by performing arithmetic processing including a calculation for multiplying the temporary irradiation amount distribution data by a correction value determined based on the result of measurement by the measurement unit. ### Claim 7 (depends on 6) The imprint apparatus according to claim 6, wherein the light which the heating unit uses for heating is heating light, and wherein the correction value is a ratio of (i) an absorption factor for the heating light of the region to be processed used for generation of the temporary irradiation amount distribution data to (ii) an absorption factor for the heating light of the region to be processed determined based on a reflectance measured by the measurement unit. ### Claim 8 (depends on 1) The imprint apparatus according to claim 1, wherein the region to be processed includes a plurality of regions to be processed on the substrate, wherein the measurement unit measures respective reflectances of the plurality of regions to be processed by receiving respective light beams reflected at the plurality of regions to be processed, and wherein the generation unit generates the irradiation amount distribution data based on respective results of measurement by the measurement unit at the plurality of regions to be processed. ### Claim 9 (depends on 1) The imprint apparatus according to claim 1, wherein the region to be processed includes a plurality of chip regions, wherein the measurement unit receives light beams reflected at a plurality of locations in one of the chip regions to measure respective reflectances at the plurality of locations, and wherein the generation unit generates the irradiation amount distribution data based on respective results of measurement by the measurement unit at the chip region. ### Claim 10 (depends on 1) The imprint apparatus according to claim 1, wherein the irradiation amount distribution data is irradiation amount distribution data for reducing a shape difference between a pattern region of the mold and the region to be processed. ### Claim 11 An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, the imprint apparatus comprising: a heating unit configured to irradiate a region to be processed on the substrate with light to heat the region to be processed; and a generation unit configured to generate irradiation amount distribution data, which indicates an irradiation amount distribution of light with which the heating unit is to irradiate the region to be processed, wherein the generation unit is configured to generate the irradiation amount distribution data by correcting, using information about absorption of the light by the region to be processed, temporary irradiation amount distribution data temporarily generated based on a shape of the region to be processed taken before the region to be processed is heated by the heating unit.