Light emitting semiconductor devices with getter layer
AssigneePhilips Photonics GmbH
InventorsUlrich Weichmann, Andreas Peter Engelhardt, Johanna Sophie Kolb, Marcel Franz Christian Schemmann, Holger Moench
Life of this patent
Estimating the term…
Loading patent…
AssigneePhilips Photonics GmbH
InventorsUlrich Weichmann, Andreas Peter Engelhardt, Johanna Sophie Kolb, Marcel Franz Christian Schemmann, Holger Moench
Estimating the term…
The invention describes a light emitting semiconductor device (100) comprising a substrate (120), a light emitting layer structure (155) and an AlGaAs getter layer (190) for reducing an impurity in the light emitting layer structure (155), the light emitting layer structure (155) comprising an active layer (140) and layers of varying Aluminum content, wherein the growth conditions of the layers of the light emitting layer structure (155) comprising Aluminum are different in comparison to the growth conditions of the AlGaAs getter layer (190). The AlGaAs getter layer (190) enables a reduction of the concentration of impurities like Sulfur etc. in the gas phase of a deposition equipment or growth reactor. The reduction of such impurities reduces the probability of incorporation of the impurities in the light emitting layer structure (155) which may affect the lifetime of the light emitting semiconductor device (100). The growth conditions are chosen out of the group Arsenic partial pressure, Oxygen partial pressure, deposition temperature, total deposition pressure and deposition rate of Aluminum. The invention further relates to a corresponding method of manufacturing such a light emitting semiconductor device (100).
A light emitting semiconductor device comprising:
A method of manufacturing a light emitting semiconductor device, the method comprising:
Dependencies are inferred from the claim text.