Apparatue for controlling movement of a substrate

An apparatus to control the movement of a substrate in the machine direction of a manufacturing process, the apparatus comprising:

• a. a machine direction, a cross-machine direction perpendicular to the machine direction, and a z-direction perpendicular to each of the machine direction and the cross-machine direction;
• b. a transport surface capable of moving a substrate in the machine direction and having a first major surface, an opposing second major surface, a first machine direction edge and a second machine direction edge;
• c. a first pair of transport surface guides wherein a first guide in the first pair of guides is positioned proximate to the first machine direction edge of the transport surface and the second guide in the first pair of guides is positioned proximate the second machine direction edge of the transport surface and directly opposite the first guide in the first pair of guides;
• d. a second pair of transport surface guides wherein a first guide in the second pair of guides is positioned proximate to the first machine direction edge of the transport surface and the second guide in the second pair of guides is positioned proximate the second machine direction edge of the transport surface and directly opposite the first guide in the second pair of guides;
• and
• e. the second pair of transport surface guides is positioned in a spaced apart relationship to the first pair of transport surface guides;
• f. wherein each of the guides in the first pair of transport surface guides and the second pair of transport surface guides limit the movement of the transport surface in the cross-machine direction and in the z-direction.