High purity cobalt chloride and manufacturing method therefor
AssigneeJx Nippon Minig & Metals Corporation
InventorGaku Kanou
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AssigneeJx Nippon Minig & Metals Corporation
InventorGaku Kanou
Estimating the term…
Provided is high purity cobalt chloride having a purity of 5N (99.999%) or higher, and a manufacturing method of the high purity cobalt chloride via electrolysis, wherein cobalt having a purity of 5N or higher is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, and electrodeposition of the cobalt onto the cathode plate is thereby inhibited. An object of this invention is to provide a manufacturing method capable of providing high purity cobalt chloride at a higher purity and at a lower production cost than conventional methods. Under circumstances where demands for cobalt chloride may increase, cobalt chloride needs to be manufactured at high volume and at low cost, and the present invention offers a technique capable of satisfying the foregoing requirements.
A manufacturing method of high purity cobalt chloride having a purity of 5N or higher, excluding gas components of O, C, N, H, S, and P, and a content of Tl as an impurity element of 1 ppm or less via electrolysis, wherein cobalt having a purity of 5N (99.999%) or higher excluding gas components of O, C, N, H, S, and P is used as an anode, a diluted hydrochloric acid bath having a pH of 1.5 to 3.0 is used as an electrolytic solution, the cobalt anode and a cathode plate are partitioned with an anion exchange membrane, cobalt is eluted from the cobalt anode into the diluted hydrochloric acid bath during the electrolysis, and electrodeposition of the cobalt in the hydrochloric acid bath onto the cathode plate is thereby inhibited by the anion exchange membrane.
High purity cobalt chloride, wherein purity of the high purity cobalt chloride is 5N or higher excluding gas components of O, C, N, H, S, and P, and content of Tl as an impurity element is 1 ppm or less.
Dependencies are inferred from the claim text.