Charge stripping film for charge stripping device of ion beam
AssigneesKaneka Corporation, Riken
InventorsMutsuaki Murakami, Masamitsu Tachibana, Atsushi Tatami, Hiroo Hasebe
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Abstract
A charge stripping film for a charge stripping device of ion beam is a carbon film produced by annealing a polymer film, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%. A charge stripping film for a charge stripping device of ion beam is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%.
Claims19
A charge stripping film for a charge stripping device of ion beam, wherein
- the charge stripping film is a carbon film produced by annealing a polymer film, and
- the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%.
A charge stripping film for a charge stripping device of ion beam, wherein
- the charge stripping film is a carbon film having a thermal conductivity in a film surface direction at 25° C. of at least 300 W/mK, and
- the charge stripping film has a film thickness of 10 μm to 150 μm, an area of at least 4 cm2, and an atomic concentration of carbon of at least 97%.
Dependencies are inferred from the claim text.