Resin composition, resist pattern-forming method and polymer
AssigneeJsr Corporation
InventorHayato Namai
Life of this patent
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Abstract
A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R1 to R4 has the fluorine atom or a group including the fluorine atom. R5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).
Claims12
A resin composition comprising:
- a solvent;
- and
- a fluorine-containing polymer comprising a structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8):
- wherein R6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group.
A polymer comprising a structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8):
- wherein R6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group.
Dependencies are inferred from the claim text.