A method for producing a Group III nitride semiconductor comprising growing a Group III nitride semiconductor through a flux method using a molten mixture of an alkali metal and a Group III metal on a seed substrate, wherein a first crucible comprising at least one selected from a group consisting of tungsten(W), molybdenum(Mo), boron nitride(BN), alumina, and yttrium aluminum garnet(YAG) is used to hold the seed substrate and the molten mixture, the first crucible is set in a reaction vessel, the reaction vessel is heated by a heating apparatus disposed outside of the reaction vessel, carbon being a graphite which is measured in a predetermined amount is placed at any place in the reaction vessel so as not to contact with the molten mixture at start of growth so that a carbon concentration of the molten mixture is made to zero before the start of growth, and the Group III nitride semiconductor is grown on the seed substrate while increasing the carbon concentration of the molten mixture after the start of growth.