Device for measuring an aberration, imaging systems and methods for measuring an aberration
AssigneeFraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
InventorsRené Berlich, Claudia Reinlein
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Abstract
A device for measuring an aberration has an image sensor, projection optics for optically projecting onto the image sensor, an optical unit for influencing the optical projection onto the image sensor so that the result on the image sensor is a multiple image of a plurality of sub-images, wherein the optical unit has at least one region per sub-image, wherein the regions influence different lateral portions of a wavefront incident on the projection optics in different ways, and an evaluator configured to determine information relating to the aberration based on the multiple image.
Claims27
A device for measuring an aberration, comprising:
- an image sensor;
- projection optics for optically projecting onto the image sensor;
- an optical unit for influencing the optical projection onto the image sensor so that the result on the image sensor is a multiple image of a plurality of sub-images, wherein the optical unit comprise at least one region per sub-image, wherein the regions influence different lateral portions of a wavefront incident on the projection optics in different ways;
- wherein different regions of the optical unit are adapted to deflect only a respective part of the wavefront to a different direction when generating the multiple image, wherein the focus is the same for the entire wavefront;
- an evaluator configured to determine information relating to the aberration on the basis of the multiple image;
- wherein the optical unit is arranged in an aperture plane of the device or in a plane into which the aperture plane is imaged;
- wherein the plurality of sub-images overlap partly, wherein the evaluator is configured to evaluate a relative change in a position of the at least one feature in the plurality of sub-images to determine the information relating to the aberration.
A method for measuring an aberration, comprising:
- providing an image sensor;
- arranging projection optics arranged in an aperture plane of a device or in a plane into which the aperture plane is imaged for optically projecting onto the image sensor;
- influencing the optical projection onto the image sensor by an optical unit so that the result is a multiple image of a plurality of sub-images on the image sensor and such that different regions of the optical unit are adapted to deflect only a respective part of the wavefront to a different direction when generating the multiple image, wherein the focus is the same for the entire wavefront;
- determining information relating to the aberration based on the multiple image;
- wherein the plurality of sub-images overlap partly, wherein the evaluator is configured to evaluate a relative change in a position of the at least one feature in the plurality of sub-images to determine the information relating to the aberration.
Dependencies are inferred from the claim text.