# US 10,321,552 B2 · Undulator magnet array and undulator > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 10,321,552 B2 - Document ID: US10321552B2 - Status: Granted - Kind: B2 - Application number: 15/521,240 - Filed: 2015-10-08 - Published: 2017-11-23 - Granted: 2019-06-11 - Earliest claimed: 2014-10-21 - Assignees: Riken - Applicants: Riken - Inventors: Ryota Kinjo; Takashi Tanaka - Web page: https://patentgrep.com/patent/US10321552B2 ## CPC - H05H 7/04: Magnet systems {, e.g. undulators, wigglers (free-electron laser H01S3/0903)}; Energisation thereof - G21K 1/20: for confining charged particles or handling confined charged particles, e.g. ion traps - H01F 7/0278: {for generating uniform fields, focusing, deflecting electrically charged particles (for magnetic separation by Lorentz force B03C1/023; specially adapted for NMR applications G01R33/383)} - H01F 7/06: Electromagnets; Actuators including electromagnets {(electric coils H01F5/00; devices for holding workpieces using electric force B23Q3/15; load-engaging elements for lifting articles electromagnetically B66C1/06; electromagnetic couplings F16D27/00; magnetic brakes F16D63/002; electromagnetically operated valves F16K11/24, F16K31/00; analysing materials by magnetic means G01N27/72, G01N27/80; electromagnets for winding mechanical clocks G04C1/02; electromagnetic relays H01H51/00; windings for salient poles of dynamo-electric machines H02K3/18; electromagnets for telegraphic communication H04L; for arc lamps H05B31/28)} - H05H 13/04: Synchrotrons - H05H: PLASMA TECHNIQUE (apparatus or processes specially adapted for producing X-rays H05G2/00); PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS - G21K: HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES - H01F: MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES ## Abstract In an undulator magnet array, an upper magnet array is formed by coupling an upper shift magnet array and an upper reference magnet array, and a lower magnet array is formed by coupling a lower reference magnet array and lower shift magnet array arranged so as to face the magnet arrays. With reference to a state where the amplitudes of periodic magnetic fields that can be formed by the upper magnet array and the lower magnet array are maximized, the upper shift magnet array is shifted ¼ of a period to the left as seen from the lower reference magnet array and the lower shift magnet array is shifted ¼ of a period to the left as seen from the upper reference magnet array. ## Claims ### Claim 1 An undulator magnet array comprising: a first magnet array and a second magnet array disposed parallel to each other with an interval therebetween so as to lie opposite to each other, a magnetization direction of magnets contained in the first magnet array and a magnetization direction of magnets contained in the second magnet array changing, in a plane through the first and second magnet arrays, periodically along a magnet arrangement direction of the respective magnet arrays, wherein the first magnet array is formed by coupling together a first shifted magnet array and a first reference magnet array each containing a first plurality of magnets, and the second magnet array is formed by coupling together a second reference magnet array and a second shifted magnet array each containing a second plurality of magnets, the first shifted magnet array is disposed opposite the second reference magnet array, the first shifted magnet array being shifted relative to the second reference magnet array by a predetermined shift amount in a predetermined direction parallel to the magnet arrangement direction as compared with in a reference state where an amplitude of a periodic magnetic field produced by the first and second magnet arrays is maximized, and the second shifted magnet array is disposed opposite the first reference magnet array, the second shifted magnet array being shifted relative to the first reference magnet array by the predetermined shift amount in the predetermined direction as compared with in the reference state. ### Claim 2 (depends on 1) The undulator magnet array of claim 1, wherein the predetermined shift amount is less than one-half of a period of change of the magnetization direction, the period being common to the first and second magnet arrays. ### Claim 3 (depends on 2) The undulator magnet array of claim 2, wherein the predetermined shift amount is one-eighth or more but three-eighths or less of the period of change of the magnetization direction. ### Claim 4 (depends on 3) The undulator magnet array of claim 3, wherein the predetermined shift amount is one-fourth of the period of change of the magnetization direction. ### Claim 5 (depends on 1) The undulator magnet array of claim 1, wherein in the first shifted magnet array, in a region within a distance corresponding to the predetermined shift amount from the first reference magnet array, a magnet whose magnetization direction is determined based on the magnetization direction of the magnets in the first reference magnet array is disposed. ### Claim 6 (depends on 5) The undulator magnet array of claim 5, wherein in the region, a magnet having a same magnetization direction as a magnetization direction of a magnet in a predetermined region in the first reference magnet array is disposed, and the predetermined region is a region located between, of opposite ends of the first reference magnet array, an end closer to the first shifted magnet array and a position displaced from the end by the predetermined shift amount in a direction opposite to the predetermined direction. ### Claim 7 (depends on 1) The undulator magnet array of claim 1, wherein the first shifted magnet array comprises a plurality of first shifted magnet arrays, the first reference magnet array comprises a plurality of first reference magnet arrays, the second shifted magnet array comprises a plurality of second shifted magnet arrays, and the second reference magnet array comprises a plurality of second reference magnet arrays, and in the first magnet array, the first shifted magnet arrays and the first reference magnet arrays are coupled together alternately, and in the second magnet array, the second reference magnet arrays and the second shifted magnet arrays are coupled together alternately. ### Claim 8 (depends on 1) An undulator, comprising: the undulator magnet array of claim 1; and a holder for holding the undulator magnet array such that a gap between the first and second magnet arrays in the undulator magnet array is variable.