# US 10,320,146 B2 · Semiconductor light-emitting element, manufacturing method of semiconductor light-emitting element, and semiconductor device

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- Number: US 10,320,146 B2
- Document ID: US10320146B2
- Status: Granted
- Kind: B2
- Application number: 14/633,363
- Filed: 2015-02-27
- Published: 2015-09-10
- Granted: 2019-06-11
- Earliest claimed: 2014-03-10
- Assignees: Sony Corporation
- Applicants: Sony Corporation
- Inventors: Kota Tokuda; Takayuki Kawasumi
- Web page: https://patentgrep.com/patent/US10320146B2

## CPC

- H01S 5/22: having a ridge or stripe structure
- H01S 5/04256: {characterised by the configuration}
- H01S 5/2214: {based on oxides or nitrides}
- H01S 5/2226: {semiconductors with a specific doping}
- H01S 5/3054: {p-doping}
- H01S 5/3213: {asymmetric clading layers}
- H01S 5/2009: {by using electron barrier layers}
- H01S 5/34333: {with a well layer based on Ga(In)N or Ga(In)P, e.g. blue laser}
- H01S 2304/04: MOCVD or MOVPE
- H01S: DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL

## Abstract

A semiconductor light-emitting element includes a laminated structure which has an active layer between a first conductivity-type semiconductor layer and a second conductivity-type semiconductor layer, a first semiconductor layer which includes at least the first conductivity-type semiconductor layer of the laminated structure, an insulation film which is formed on the first semiconductor layer and has an opening, and a second semiconductor layer which is formed on the insulation film and includes at least the second conductivity-type semiconductor layer of the laminated structure. The second semiconductor layer includes a first region facing the opening of the insulation film and a second region not facing the opening, and the second region has a portion with a higher impurity concentration than the first region.

## Claims

### Claim 1

A semiconductor light-emitting element comprising:
an active layer between a first semiconductor layer of first conductivity-type and a compound semiconductor layer of a second conductivity-type, the second conductivity-type is opposite to the first conductivity-type;
an insulation film between the compound semiconductor layer and a second semiconductor layer of the second conductivity-type, a first region of the second semiconductor layer is adjacent a second region of the second semiconductor layer in a cross-sectional view of the semiconductor light-emitting element,
wherein the second semiconductor layer is between the insulation film and a contact layer of the second conductivity-type, the contact layer is in direct physical contact with the first region at a boundary between the first region and the contact layer,
wherein the first region extends into an opening in the insulation film to a boundary between the compound semiconductor layer and the first region, the insulation film surrounds the opening in the cross-sectional view,
wherein a first boundary portion of the first region is at the boundary between the compound semiconductor layer and the first region, a concentration for an impurity of the second conductivity-type in the second region is higher than a concentration for an impurity of the second conductivity-type in the first boundary portion of the first region, and
wherein a second boundary portion of the first region is at the boundary between the first region and the contact layer, the concentration for an impurity of the second conductivity-type in the second region is higher than a concentration for an impurity of the second conductivity-type in the second boundary portion of the first region.

### Claim 2 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the first boundary portion of the first region is in direct physical contact with the compound semiconductor layer.

### Claim 3 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the active layer is a quantum well layer.

### Claim 4 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the insulation film comprises a silicon oxide.

### Claim 5 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the insulation film is in direct physical contact with the compound semiconductor layer and the second region.

### Claim 6 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the insulation film is between the compound semiconductor layer and the second region in a manner that prevents the second region from being in direct physical contact with the compound semiconductor layer.

### Claim 7 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the compound semiconductor layer is between the first semiconductor layer and the insulation film.

### Claim 8 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the second region surrounds the first region in the cross-sectional view.

### Claim 9 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the second region has a smaller electrical resistivity than the first region.

### Claim 10 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the first region is in direct physical contact with the compound semiconductor layer and the contact layer.

### Claim 11 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the contact layer is between an electrode and the second semiconductor layer.

### Claim 12 (depends on 11)

The semiconductor light-emitting element according to claim 11, wherein the contact layer is in direct physical contact with the electrode and the second semiconductor layer.

### Claim 13 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the concentration for an impurity of the second conductivity-type in the second region is higher than a concentration for an impurity of the second conductivity-type throughout the first region.

### Claim 14 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the concentration for the impurity of the second conductivity-type throughout the second region is higher than the concentration for the impurity of the second conductivity-type throughout the first region.

### Claim 15 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein a ratio of the concentration for an impurity of the second conductivity-type throughout the portion of the second region to the concentration for an impurity of the second conductivity-type throughout the portion of the first region is from 2 to 20.

### Claim 16 (depends on 1)

The semiconductor light-emitting element according to claim 1, wherein the second semiconductor layer contains nitrogen (N) and at least one element of gallium (Ga), aluminum (Al), indium (In), and boron (B).

### Claim 17 (depends on 1)

The semiconductor light-emitting element according to claim 1, further comprising:
another electrode electrically connected directly to the first semiconductor layer.

### Claim 18 (depends on 1)

A semiconductor device comprising:
the semiconductor light-emitting element according to claim 1.
